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Deposition of HMDSO-based coatings on PET substrates using an atmospheric pressure dielectric barrier discharge

Rino Morent UGent, Nathalie De Geyter UGent, Sandra Van Vlierberghe UGent, Peter Dubruel UGent, Christophe Leys UGent, L. Gengembre, Etienne Schacht UGent and E. Payen (2009) Progress in Organic Coatings. 64(2-3). p.304-310
abstract
This paper presents results on the formation of coatings in an atmospheric pressure dielectric barrier discharge using hexamethyldisiloxane (HMDSO) as gaseous precursor. Plasma-polymerized films are deposited onto polyethylene terephthalate (PET) films using argon and argon/air mixtures as carrier gases. The chemical and physical properties of the obtained coatings are discussed in detail using Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). FTIR and XPS results show that the composition of the gas phase and the chemical structure of the obtained coatings are clearly correlated. When pure argon is used as working gas, the film is polymeric with a structure close to [(CH3)(2)-Si-O](n), which means that the deposited films resemble PDMS. However, if plasma-polymerization occurs in argon/air mixtures, the deposited film is silica-like containing only few carbon atoms. These dense SiOx coatings generally exhibit high barrier properties, while pure HMDSO-derived films might be of importance for selective permeation. From this point of view, the capability of controlling the film composition by varying the operation conditions opens interesting perspectives. (C) 2008 Elsevier B.V. All rights reserved.
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (review)
publication status
published
subject
keyword
Argon, Nitrogen, Nonequilibrium, Polymers, Plasma-polymerization, Glow-Discharge, Hexamethyldisiloxane, Dielectric barrier discharge, Atmospheric pressure, Organosilicon Thin Films, Plasma Polymerization, Surface-Treatment, 2P Core Level, Helium
journal title
Progress in Organic Coatings
Prog. Org. Coat.
volume
64
issue
2-3
pages
304 - 310
publisher
Elsevier Science SA
place of publication
Lausanne, Switzerland
Web of Science type
Review
Web of Science id
000263634300031
JCR category
MATERIALS SCIENCE, COATINGS & FILMS
JCR impact factor
1.669 (2009)
JCR rank
5/16 (2009)
JCR quartile
2 (2009)
ISSN
0300-9440
DOI
10.1016/j.porgcoat.2008.07.030
language
English
UGent publication?
yes
classification
A1
id
520094
handle
http://hdl.handle.net/1854/LU-520094
date created
2009-03-17 11:58:24
date last changed
2009-04-01 09:15:15
@article{520094,
  abstract     = {This paper presents results on the formation of coatings in an atmospheric pressure dielectric barrier discharge using hexamethyldisiloxane (HMDSO) as gaseous precursor. Plasma-polymerized films are deposited onto polyethylene terephthalate (PET) films using argon and argon/air mixtures as carrier gases. The chemical and physical properties of the obtained coatings are discussed in detail using Fourier transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). FTIR and XPS results show that the composition of the gas phase and the chemical structure of the obtained coatings are clearly correlated. When pure argon is used as working gas, the film is polymeric with a structure close to [(CH3)(2)-Si-O](n), which means that the deposited films resemble PDMS. However, if plasma-polymerization occurs in argon/air mixtures, the deposited film is silica-like containing only few carbon atoms. These dense SiOx coatings generally exhibit high barrier properties, while pure HMDSO-derived films might be of importance for selective permeation. From this point of view, the capability of controlling the film composition by varying the operation conditions opens interesting perspectives. (C) 2008 Elsevier B.V. All rights reserved.},
  author       = {Morent, Rino and De Geyter, Nathalie and Van Vlierberghe, Sandra and Dubruel, Peter and Leys, Christophe and Gengembre, L. and Schacht, Etienne and Payen, E.},
  issn         = {0300-9440},
  journal      = {Progress in Organic Coatings},
  keyword      = {Argon,Nitrogen,Nonequilibrium,Polymers,Plasma-polymerization,Glow-Discharge,Hexamethyldisiloxane,Dielectric barrier discharge,Atmospheric pressure,Organosilicon Thin Films,Plasma Polymerization,Surface-Treatment,2P Core Level,Helium},
  language     = {eng},
  number       = {2-3},
  pages        = {304--310},
  publisher    = {Elsevier Science SA},
  title        = {Deposition of HMDSO-based coatings on PET substrates using an atmospheric pressure dielectric barrier discharge},
  url          = {http://dx.doi.org/10.1016/j.porgcoat.2008.07.030},
  volume       = {64},
  year         = {2009},
}

Chicago
Morent, Rino, Nathalie De Geyter, Sandra Van Vlierberghe, Peter Dubruel, Christophe Leys, L. Gengembre, Etienne Schacht, and E. Payen. 2009. “Deposition of HMDSO-based Coatings on PET Substrates Using an Atmospheric Pressure Dielectric Barrier Discharge.” Progress in Organic Coatings 64 (2-3): 304–310.
APA
Morent, R., De Geyter, N., Van Vlierberghe, S., Dubruel, P., Leys, C., Gengembre, L., Schacht, E., et al. (2009). Deposition of HMDSO-based coatings on PET substrates using an atmospheric pressure dielectric barrier discharge. Progress in Organic Coatings, 64(2-3), 304–310.
Vancouver
1.
Morent R, De Geyter N, Van Vlierberghe S, Dubruel P, Leys C, Gengembre L, et al. Deposition of HMDSO-based coatings on PET substrates using an atmospheric pressure dielectric barrier discharge. Progress in Organic Coatings. Lausanne, Switzerland: Elsevier Science SA; 2009;64(2-3):304–10.
MLA
Morent, Rino, Nathalie De Geyter, Sandra Van Vlierberghe, et al. “Deposition of HMDSO-based Coatings on PET Substrates Using an Atmospheric Pressure Dielectric Barrier Discharge.” Progress in Organic Coatings 64.2-3 (2009): 304–310. Print.