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Deposition of polymethyl methacrylate on polypropylene substrates using an atmospheric pressure dielectric barrier discharge

Nathalie De Geyter UGent, Rino Morent UGent, Sandra Van Vlierberghe UGent, Peter Dubruel UGent, Christophe Leys UGent, L. Gengembre, Etienne Schacht and E. Payen (2009) Progress in Organic Coatings. 64(2-3). p.230-237
abstract
In this work, an atmospheric pressure glow-like dielectric barrier discharge in helium with small admixtures of methyl methacrylate (MMA) is used for the deposition of thin polymethyl methacrylate (PMMA) films. The effect of discharge power and feed composition (monomer concentration) on film properties has been investigated by means of Fourier-transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The results are described by defining a W/FM value. where W is the discharge power, F the monomer flow rate and M is the molecular weight of the monomer. It is shown in this paper, that the deposition rate and the chemical composition of the deposited film change with varying W/FM values. At low W/FM values, high deposition rates of up to 2 nm/s are observed and the plasma-polymerized MMA chemically resembles the conventionally synthesized PMMA. In contrast, using high W/FM values (>= 102 MJ/kg) leads to lower deposition rates (as low as 0.9 nm/s), while the plasma-polymerized MMA films contain less ester groups and a larger amount of ether and/or alcohol groups. One should therefore carefully choose the deposition parameters in order to obtain a high deposition rate and a high retention of ester groups in the plasma-polymerized MMA films. (C) 2008 Elsevier B.V. All rights reserved.
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (review)
publication status
published
subject
keyword
Polymerized methyl-methacrylate, Plasma Polymerization, Plasma-polymerization, Surface-Treatment, Atmospheric pressure, Methyl methacrylate, Glow-discharge, Dielectric barrier discharge, Thin-Films, Coatings, Nitrogen
journal title
Progress in Organic Coatings
Prog. Org. Coat.
volume
64
issue
2-3
pages
230 - 237
publisher
Elsevier Science SA
place of publication
Lausanne, Switzerland
Web of Science type
Review
Web of Science id
000263634300020
JCR category
MATERIALS SCIENCE, COATINGS & FILMS
JCR impact factor
1.669 (2009)
JCR rank
5/16 (2009)
JCR quartile
2 (2009)
ISSN
0300-9440
DOI
10.1016/j.porgcoat.2008.07.029
language
English
UGent publication?
yes
classification
A1
id
520018
handle
http://hdl.handle.net/1854/LU-520018
date created
2009-03-17 11:34:10
date last changed
2017-01-02 09:55:55
@article{520018,
  abstract     = {In this work, an atmospheric pressure glow-like dielectric barrier discharge in helium with small admixtures of methyl methacrylate (MMA) is used for the deposition of thin polymethyl methacrylate (PMMA) films. The effect of discharge power and feed composition (monomer concentration) on film properties has been investigated by means of Fourier-transform infrared spectroscopy (FTIR), X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM). The results are described by defining a W/FM value. where W is the discharge power, F the monomer flow rate and M is the molecular weight of the monomer. It is shown in this paper, that the deposition rate and the chemical composition of the deposited film change with varying W/FM values. At low W/FM values, high deposition rates of up to 2 nm/s are observed and the plasma-polymerized MMA chemically resembles the conventionally synthesized PMMA. In contrast, using high W/FM values ({\textrangle}= 102 MJ/kg) leads to lower deposition rates (as low as 0.9 nm/s), while the plasma-polymerized MMA films contain less ester groups and a larger amount of ether and/or alcohol groups. One should therefore carefully choose the deposition parameters in order to obtain a high deposition rate and a high retention of ester groups in the plasma-polymerized MMA films. (C) 2008 Elsevier B.V. All rights reserved.},
  author       = {De Geyter, Nathalie and Morent, Rino and Van Vlierberghe, Sandra and Dubruel, Peter and Leys, Christophe and Gengembre, L. and Schacht, Etienne and Payen, E.},
  issn         = {0300-9440},
  journal      = {Progress in Organic Coatings},
  keyword      = {Polymerized methyl-methacrylate,Plasma Polymerization,Plasma-polymerization,Surface-Treatment,Atmospheric pressure,Methyl methacrylate,Glow-discharge,Dielectric barrier discharge,Thin-Films,Coatings,Nitrogen},
  language     = {eng},
  number       = {2-3},
  pages        = {230--237},
  publisher    = {Elsevier Science SA},
  title        = {Deposition of polymethyl methacrylate on polypropylene substrates using an atmospheric pressure dielectric barrier discharge},
  url          = {http://dx.doi.org/10.1016/j.porgcoat.2008.07.029},
  volume       = {64},
  year         = {2009},
}

Chicago
De Geyter, Nathalie, Rino Morent, Sandra Van Vlierberghe, Peter Dubruel, Christophe Leys, L. Gengembre, Etienne Schacht, and E. Payen. 2009. “Deposition of Polymethyl Methacrylate on Polypropylene Substrates Using an Atmospheric Pressure Dielectric Barrier Discharge.” Progress in Organic Coatings 64 (2-3): 230–237.
APA
De Geyter, Nathalie, Morent, R., Van Vlierberghe, S., Dubruel, P., Leys, C., Gengembre, L., Schacht, E., et al. (2009). Deposition of polymethyl methacrylate on polypropylene substrates using an atmospheric pressure dielectric barrier discharge. Progress in Organic Coatings, 64(2-3), 230–237.
Vancouver
1.
De Geyter N, Morent R, Van Vlierberghe S, Dubruel P, Leys C, Gengembre L, et al. Deposition of polymethyl methacrylate on polypropylene substrates using an atmospheric pressure dielectric barrier discharge. Progress in Organic Coatings. Lausanne, Switzerland: Elsevier Science SA; 2009;64(2-3):230–7.
MLA
De Geyter, Nathalie, Rino Morent, Sandra Van Vlierberghe, et al. “Deposition of Polymethyl Methacrylate on Polypropylene Substrates Using an Atmospheric Pressure Dielectric Barrier Discharge.” Progress in Organic Coatings 64.2-3 (2009): 230–237. Print.