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Method to determine the sticking coefficient of O₂ on deposited Al during reactive magnetron sputtering, using mass spectrometry

Wouter Leroy (UGent) , Stijn Mahieu (UGent) , Rosita Persoons and Diederik Depla (UGent)
(2009) PLASMA PROCESSES AND POLYMERS. 6(suppl. 1). p.342-346
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Abstract
Models describing the reactive sputtering process need experimental input for some important parameters as the knock-on yield, the reaction rate constant, the sticking coefficient on the target and the sticking coefficient on the deposited material. Here, a method is described to calculate the sticking coefficient of O2 on the deposited material, during the reactive magnetron sputtering. Mass spectrometry is used to measure local, effective O2 partial pressure during sputtering, at the position of the sample. Combined with electron probe microscopy analysis of the oxygen content in deposited layers, we calculate the sticking coefficient. At our conditions, a local, effective pressure of (5.26+/-0.44)x10E-6 mbar was found and an average sticking coefficient of 0.107+/-0.032 for O2 on deposited aluminium during reactive magnetron sputtering.
Keywords
sticking coefficient, oxides, mass spectrometry, thin film, sputtering

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MLA
Leroy, Wouter, Stijn Mahieu, Rosita Persoons, et al. “Method to Determine the Sticking Coefficient of O₂ on Deposited Al During Reactive Magnetron Sputtering, Using Mass Spectrometry.” PLASMA PROCESSES AND POLYMERS 6.suppl. 1 (2009): 342–346. Print.
APA
Leroy, W., Mahieu, S., Persoons, R., & Depla, D. (2009). Method to determine the sticking coefficient of O₂ on deposited Al during reactive magnetron sputtering, using mass spectrometry. PLASMA PROCESSES AND POLYMERS, 6(suppl. 1), 342–346. Presented at the 11th International conference on Plasma Surface Engineering (PSE 2008).
Chicago author-date
Leroy, Wouter, Stijn Mahieu, Rosita Persoons, and Diederik Depla. 2009. “Method to Determine the Sticking Coefficient of O₂ on Deposited Al During Reactive Magnetron Sputtering, Using Mass Spectrometry.” Plasma Processes and Polymers 6 (suppl. 1): 342–346.
Chicago author-date (all authors)
Leroy, Wouter, Stijn Mahieu, Rosita Persoons, and Diederik Depla. 2009. “Method to Determine the Sticking Coefficient of O₂ on Deposited Al During Reactive Magnetron Sputtering, Using Mass Spectrometry.” Plasma Processes and Polymers 6 (suppl. 1): 342–346.
Vancouver
1.
Leroy W, Mahieu S, Persoons R, Depla D. Method to determine the sticking coefficient of O₂ on deposited Al during reactive magnetron sputtering, using mass spectrometry. PLASMA PROCESSES AND POLYMERS. 2009;6(suppl. 1):342–6.
IEEE
[1]
W. Leroy, S. Mahieu, R. Persoons, and D. Depla, “Method to determine the sticking coefficient of O₂ on deposited Al during reactive magnetron sputtering, using mass spectrometry,” PLASMA PROCESSES AND POLYMERS, vol. 6, no. suppl. 1, pp. 342–346, 2009.
@article{512408,
  abstract     = {Models describing the reactive sputtering process need experimental input for some important parameters as the knock-on yield, the reaction rate constant, the sticking coefficient on the target and the sticking coefficient on the deposited material. Here, a method is described to calculate the sticking coefficient of O2 on the deposited material, during the reactive magnetron sputtering. Mass spectrometry is used to measure local, effective O2 partial pressure during sputtering, at the position of the sample. Combined with electron probe microscopy analysis of the oxygen content in deposited layers, we calculate the sticking coefficient. At our conditions, a local, effective pressure of (5.26+/-0.44)x10E-6 mbar was found and an average sticking coefficient of 0.107+/-0.032 for O2 on deposited aluminium during reactive magnetron sputtering.},
  author       = {Leroy, Wouter and Mahieu, Stijn and Persoons, Rosita and Depla, Diederik},
  issn         = {1612-8869},
  journal      = {PLASMA PROCESSES AND POLYMERS},
  keywords     = {sticking coefficient,oxides,mass spectrometry,thin film,sputtering},
  language     = {eng},
  location     = {Garmisch-Partenkirchen, Germany},
  number       = {suppl. 1},
  pages        = {342--346},
  title        = {Method to determine the sticking coefficient of O₂ on deposited Al during reactive magnetron sputtering, using mass spectrometry},
  url          = {http://dx.doi.org/10.1002/ppap.200932401},
  volume       = {6},
  year         = {2009},
}

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