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Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films

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Abstract
The morphological stability of NiSi is investigated when 40% of Si is mixed into an as deposited 10 nm Ni film. When annealing at 3 °C/s, scanning electron microscopy images and in situ sheet-resistance measurements show that NiSi agglomeration is delayed by more than 100 °C. In situ x-ray diffraction reveals that NiSi grows from an unusual transient hexagonal theta-nickel-silicide phase. The significant improvement of the NiSi film's morphological stability can be related to its microstructure, with large grains and a strong texture. This peculiar microstructure is compared to the microstructure of the theta-nickel-silicide precursor by electron backscattering diffraction and pole figures.
Keywords
electron backscattering, X-ray diffraction, annealing, electron diffraction, grain size, metallic thin films, nickel alloys, texture, silicon alloys, scanning electron microscopy

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Chicago
Van Bockstael, Charlotte, Koen De Keyser, Roland Van Meirhaeghe, Christophe Detavernier, Jean Jordan-Sweet, and Christian Lavoie. 2009. “Influence of a Transient Hexagonal Phase on the Microstructure and Morphological Stability of NiSi Films.” Applied Physics Letters 94 (3).
APA
Van Bockstael, C., De Keyser, K., Van Meirhaeghe, R., Detavernier, C., Jordan-Sweet, J., & Lavoie, C. (2009). Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films. Applied Physics Letters, 94(3).
Vancouver
1.
Van Bockstael C, De Keyser K, Van Meirhaeghe R, Detavernier C, Jordan-Sweet J, Lavoie C. Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films. Applied Physics Letters. 2009;94(3).
MLA
Van Bockstael, Charlotte, Koen De Keyser, Roland Van Meirhaeghe, et al. “Influence of a Transient Hexagonal Phase on the Microstructure and Morphological Stability of NiSi Films.” Applied Physics Letters 94.3 (2009): n. pag. Print.
@article{480492,
  abstract     = {The morphological stability of NiSi is investigated when 40\% of Si is mixed into an as deposited 10 nm Ni film. When annealing at 3 {\textdegree}C/s, scanning electron microscopy images and in situ sheet-resistance measurements show that NiSi agglomeration is delayed by more than 100 {\textdegree}C. In situ x-ray diffraction reveals that NiSi grows from an unusual transient hexagonal theta-nickel-silicide phase. The significant improvement of the NiSi film's morphological stability can be related to its microstructure, with large grains and a strong texture. This peculiar microstructure is compared to the microstructure of the theta-nickel-silicide precursor by electron backscattering diffraction and pole figures.},
  author       = {Van Bockstael, Charlotte and De Keyser, Koen and Van Meirhaeghe, Roland and Detavernier, Christophe and Jordan-Sweet, Jean and Lavoie, Christian},
  issn         = {0003-6951},
  journal      = {Applied Physics Letters},
  language     = {eng},
  number       = {3},
  title        = {Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films},
  url          = {http://dx.doi.org/10.1063/1.3073750},
  volume       = {94},
  year         = {2009},
}

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