Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films
- Author
- Charlotte Van Bockstael, Koen De Keyser, Roland Van Meirhaeghe, Christophe Detavernier (UGent) , Jean Jordan-Sweet and Christian Lavoie
- Organization
- Abstract
- The morphological stability of NiSi is investigated when 40% of Si is mixed into an as deposited 10 nm Ni film. When annealing at 3 °C/s, scanning electron microscopy images and in situ sheet-resistance measurements show that NiSi agglomeration is delayed by more than 100 °C. In situ x-ray diffraction reveals that NiSi grows from an unusual transient hexagonal theta-nickel-silicide phase. The significant improvement of the NiSi film's morphological stability can be related to its microstructure, with large grains and a strong texture. This peculiar microstructure is compared to the microstructure of the theta-nickel-silicide precursor by electron backscattering diffraction and pole figures.
- Keywords
- electron backscattering, X-ray diffraction, annealing, electron diffraction, grain size, metallic thin films, nickel alloys, texture, silicon alloys, scanning electron microscopy
Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-480492
- MLA
- Van Bockstael, Charlotte, et al. “Influence of a Transient Hexagonal Phase on the Microstructure and Morphological Stability of NiSi Films.” Applied Physics Letters, vol. 94, no. 3, 2009, doi:10.1063/1.3073750.
- APA
- Van Bockstael, C., De Keyser, K., Van Meirhaeghe, R., Detavernier, C., Jordan-Sweet, J., & Lavoie, C. (2009). Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films. Applied Physics Letters, 94(3). https://doi.org/10.1063/1.3073750
- Chicago author-date
- Van Bockstael, Charlotte, Koen De Keyser, Roland Van Meirhaeghe, Christophe Detavernier, Jean Jordan-Sweet, and Christian Lavoie. 2009. “Influence of a Transient Hexagonal Phase on the Microstructure and Morphological Stability of NiSi Films.” Applied Physics Letters 94 (3). https://doi.org/10.1063/1.3073750.
- Chicago author-date (all authors)
- Van Bockstael, Charlotte, Koen De Keyser, Roland Van Meirhaeghe, Christophe Detavernier, Jean Jordan-Sweet, and Christian Lavoie. 2009. “Influence of a Transient Hexagonal Phase on the Microstructure and Morphological Stability of NiSi Films.” Applied Physics Letters 94 (3). doi:10.1063/1.3073750.
- Vancouver
- 1.Van Bockstael C, De Keyser K, Van Meirhaeghe R, Detavernier C, Jordan-Sweet J, Lavoie C. Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films. Applied Physics Letters. 2009;94(3).
- IEEE
- [1]C. Van Bockstael, K. De Keyser, R. Van Meirhaeghe, C. Detavernier, J. Jordan-Sweet, and C. Lavoie, “Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films,” Applied Physics Letters, vol. 94, no. 3, 2009.
@article{480492, abstract = {{The morphological stability of NiSi is investigated when 40% of Si is mixed into an as deposited 10 nm Ni film. When annealing at 3 °C/s, scanning electron microscopy images and in situ sheet-resistance measurements show that NiSi agglomeration is delayed by more than 100 °C. In situ x-ray diffraction reveals that NiSi grows from an unusual transient hexagonal theta-nickel-silicide phase. The significant improvement of the NiSi film's morphological stability can be related to its microstructure, with large grains and a strong texture. This peculiar microstructure is compared to the microstructure of the theta-nickel-silicide precursor by electron backscattering diffraction and pole figures.}}, author = {{Van Bockstael, Charlotte and De Keyser, Koen and Van Meirhaeghe, Roland and Detavernier, Christophe and Jordan-Sweet, Jean and Lavoie, Christian}}, issn = {{0003-6951}}, journal = {{Applied Physics Letters}}, keywords = {{electron backscattering,X-ray diffraction,annealing,electron diffraction,grain size,metallic thin films,nickel alloys,texture,silicon alloys,scanning electron microscopy}}, language = {{eng}}, number = {{3}}, title = {{Influence of a transient hexagonal phase on the microstructure and morphological stability of NiSi films}}, url = {{http://doi.org/10.1063/1.3073750}}, volume = {{94}}, year = {{2009}}, }
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