Academic Bibliography

 Search 200 years of publications by Ghent University researchers.
Advanced search
1 file | 2.07 MB
Add to list
  1. Search results
  2. Mid-infrared resonant ablation of PMMA

Mid-infrared resonant ablation of PMMA

Sanjeev Naithani (UGent) , Arnaud Grisard, David Schaubroeck (UGent) , Eric Lallier and Geert Van Steenberge (UGent)
(2014) JOURNAL OF LASER MICRO NANOENGINEERING. 9(2). p.147-152
Author
Organization
Abstract
Laser ablation proved to be a reliable micro-fabrication technique for patterning and structuring of both thin film and bulk polymer materials. In most of the industrial applications ultra-violet (UV) laser sources are employed, however they have limitations such as maintenance costs and practical issues. As an alternative and promising approach, mid-infrared resonant laser ablation (RIA) has been introduced, in which the laser wavelength is tuned to one of the molecular vibrational transi-tions of the polymer to be ablated. Consequently, the technique is selective in respect of processing a diversity of polymers which usually have different infrared absorption bands. In this paper, we present mid-infrared resonant ablation of PolyMethyl MethAcrylate (PMMA), employing nanosec-ond laser pulses tunable between 3 and 4 microns. This RIA nanosecond laser set-up is based on a commercial laser at 1064 nm pumping a singly resonant Optical Parametric Oscillator (OPO) built around a Periodically-Poled Lithium Niobate (PPLN) crystal with several Quasi-Phase Matching (QPM) periods. RIA has been successfully demonstrated for structuring bulk PMMA, and selective patterning of PMMA thin films on a glass substrate has been implemented.
Keywords
resonant ablation, PULSED-LASER DEPOSITION, tunable laser, PMMA, mid-infrared laser, Laser machining, FREE-ELECTRON LASER, POLYMER-FILMS, FABRICATION, PICOSECOND, RADIATION

Downloads

  • Download
    JLMN2014.pdf
    • full text
    • |
    • open access
    • |
    • PDF
    • |
    • 2.07 MB

Citation

Please use this url to cite or link to this publication:

MLA
Naithani, Sanjeev, et al. “Mid-Infrared Resonant Ablation of PMMA.” JOURNAL OF LASER MICRO NANOENGINEERING, vol. 9, no. 2, 2014, pp. 147–52, doi:10.2961/jlmn.2014.02.0013.
APA
Naithani, S., Grisard, A., Schaubroeck, D., Lallier, E., & Van Steenberge, G. (2014). Mid-infrared resonant ablation of PMMA. JOURNAL OF LASER MICRO NANOENGINEERING, 9(2), 147–152. https://doi.org/10.2961/jlmn.2014.02.0013
Chicago author-date
Naithani, Sanjeev, Arnaud Grisard, David Schaubroeck, Eric Lallier, and Geert Van Steenberge. 2014. “Mid-Infrared Resonant Ablation of PMMA.” JOURNAL OF LASER MICRO NANOENGINEERING 9 (2): 147–52. https://doi.org/10.2961/jlmn.2014.02.0013.
Chicago author-date (all authors)
Naithani, Sanjeev, Arnaud Grisard, David Schaubroeck, Eric Lallier, and Geert Van Steenberge. 2014. “Mid-Infrared Resonant Ablation of PMMA.” JOURNAL OF LASER MICRO NANOENGINEERING 9 (2): 147–152. doi:10.2961/jlmn.2014.02.0013.
Vancouver
1.
Naithani S, Grisard A, Schaubroeck D, Lallier E, Van Steenberge G. Mid-infrared resonant ablation of PMMA. JOURNAL OF LASER MICRO NANOENGINEERING. 2014;9(2):147–52.
IEEE
[1]
S. Naithani, A. Grisard, D. Schaubroeck, E. Lallier, and G. Van Steenberge, “Mid-infrared resonant ablation of PMMA,” JOURNAL OF LASER MICRO NANOENGINEERING, vol. 9, no. 2, pp. 147–152, 2014.
@article{4443450,
  abstract     = {{Laser ablation proved to be a reliable micro-fabrication technique for patterning and structuring of both thin film and bulk polymer materials. In most of the industrial applications ultra-violet (UV) laser sources are employed, however they have limitations such as maintenance costs and practical issues. As an alternative and promising approach, mid-infrared resonant laser ablation (RIA) has been introduced, in which the laser wavelength is tuned to one of the molecular vibrational transi-tions of the polymer to be ablated. Consequently, the technique is selective in respect of processing a diversity of polymers which usually have different infrared absorption bands. In this paper, we present mid-infrared resonant ablation of PolyMethyl MethAcrylate (PMMA), employing nanosec-ond laser pulses tunable between 3 and 4 microns. This RIA nanosecond laser set-up is based on a commercial laser at 1064 nm pumping a singly resonant Optical Parametric Oscillator (OPO) built around a Periodically-Poled Lithium Niobate (PPLN) crystal with several Quasi-Phase Matching (QPM) periods. RIA has been successfully demonstrated for structuring bulk PMMA, and selective patterning of PMMA thin films on a glass substrate has been implemented.}},
  author       = {{Naithani, Sanjeev and Grisard, Arnaud and Schaubroeck, David and Lallier, Eric and Van Steenberge, Geert}},
  issn         = {{1880-0688}},
  journal      = {{JOURNAL OF LASER MICRO NANOENGINEERING}},
  keywords     = {{resonant ablation,PULSED-LASER DEPOSITION,tunable laser,PMMA,mid-infrared laser,Laser machining,FREE-ELECTRON LASER,POLYMER-FILMS,FABRICATION,PICOSECOND,RADIATION}},
  language     = {{eng}},
  number       = {{2}},
  pages        = {{147--152}},
  title        = {{Mid-infrared resonant ablation of PMMA}},
  url          = {{http://doi.org/10.2961/jlmn.2014.02.0013}},
  volume       = {{9}},
  year         = {{2014}},
}
Altmetric
View in Altmetric
Web of Science
Times cited: