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Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition

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MLA
XIE, Q, Jan Musschoot, Davy Deduytsche, et al. “Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition.” JOURNAL OF THE ELECTROCHEMICAL SOCIETY 155.9 (2008): 688. Print.
APA
XIE, Q., Musschoot, J., Deduytsche, D., Vanmeirhaeghe, R., Detavernier, C., VAN DEN BERGHE, S., JIANG, Y., et al. (2008). Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 155(9), 688.
Chicago author-date
XIE, Q, Jan Musschoot, Davy Deduytsche, Roland Vanmeirhaeghe, Christophe Detavernier, S VAN DEN BERGHE, YL JIANG, GP RU, BZ LI, and XP QU. 2008. “Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition.” Journal of the Electrochemical Society 155 (9): 688.
Chicago author-date (all authors)
XIE, Q, Jan Musschoot, Davy Deduytsche, Roland Vanmeirhaeghe, Christophe Detavernier, S VAN DEN BERGHE, YL JIANG, GP RU, BZ LI, and XP QU. 2008. “Growth Kinetics and Crystallization Behavior of TiO2 Films Prepared by Plasma Enhanced Atomic Layer Deposition.” Journal of the Electrochemical Society 155 (9): 688.
Vancouver
1.
XIE Q, Musschoot J, Deduytsche D, Vanmeirhaeghe R, Detavernier C, VAN DEN BERGHE S, et al. Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition. JOURNAL OF THE ELECTROCHEMICAL SOCIETY. 2008;155(9):688.
IEEE
[1]
Q. XIE et al., “Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition,” JOURNAL OF THE ELECTROCHEMICAL SOCIETY, vol. 155, no. 9, p. 688, 2008.
@article{437313,
  author       = {XIE, Q and Musschoot, Jan and Deduytsche, Davy and Vanmeirhaeghe, Roland and Detavernier, Christophe and VAN DEN BERGHE, S and JIANG, YL and RU, GP and LI, BZ and QU, XP},
  issn         = {0013-4651},
  journal      = {JOURNAL OF THE ELECTROCHEMICAL SOCIETY},
  language     = {eng},
  number       = {9},
  pages        = {H688-H692},
  title        = {Growth kinetics and crystallization behavior of TiO2 films prepared by plasma enhanced atomic layer deposition},
  volume       = {155},
  year         = {2008},
}

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