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In-situ X-ray Diffraction study of Metal Induced Crystallization of amorphous silicon

(2008) THIN SOLID FILMS. 516(15). p.4946-4952
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MLA
Knaepen, Werner, Christophe Detavernier, Roland Vanmeirhaeghe, et al. “In-situ X-ray Diffraction Study of Metal Induced Crystallization of Amorphous Silicon.” THIN SOLID FILMS 516.15 (2008): 4946–4952. Print.
APA
Knaepen, W., Detavernier, C., Vanmeirhaeghe, R., SWEET, J., & LAVOIE, C. (2008). In-situ X-ray Diffraction study of Metal Induced Crystallization of amorphous silicon. THIN SOLID FILMS, 516(15), 4946–4952.
Chicago author-date
Knaepen, Werner, Christophe Detavernier, Roland Vanmeirhaeghe, JJ SWEET, and C LAVOIE. 2008. “In-situ X-ray Diffraction Study of Metal Induced Crystallization of Amorphous Silicon.” Thin Solid Films 516 (15): 4946–4952.
Chicago author-date (all authors)
Knaepen, Werner, Christophe Detavernier, Roland Vanmeirhaeghe, JJ SWEET, and C LAVOIE. 2008. “In-situ X-ray Diffraction Study of Metal Induced Crystallization of Amorphous Silicon.” Thin Solid Films 516 (15): 4946–4952.
Vancouver
1.
Knaepen W, Detavernier C, Vanmeirhaeghe R, SWEET J, LAVOIE C. In-situ X-ray Diffraction study of Metal Induced Crystallization of amorphous silicon. THIN SOLID FILMS. 2008;516(15):4946–52.
IEEE
[1]
W. Knaepen, C. Detavernier, R. Vanmeirhaeghe, J. SWEET, and C. LAVOIE, “In-situ X-ray Diffraction study of Metal Induced Crystallization of amorphous silicon,” THIN SOLID FILMS, vol. 516, no. 15, pp. 4946–4952, 2008.
@article{437298,
  author       = {Knaepen, Werner and Detavernier, Christophe and Vanmeirhaeghe, Roland and SWEET, JJ and LAVOIE, C},
  issn         = {0040-6090},
  journal      = {THIN SOLID FILMS},
  language     = {eng},
  number       = {15},
  pages        = {4946--4952},
  title        = {In-situ X-ray Diffraction study of Metal Induced Crystallization of amorphous silicon},
  volume       = {516},
  year         = {2008},
}

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