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Citation

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Chicago
Dendooven, Jolien, Sreeprasanth Pulinthanathu Sree, Robbert Van Hove, Kilian Devloo-Casier, Mikhail Baklanov, Johan Martens, and Christophe Detavernier. 2011. “Characterization of ALD Coatings in Nanoporous Thin Films by Ellipsometric Porosimetry.” In Atomic Layer Deposition, 11th International Conference, Abstracts.
APA
Dendooven, J., Pulinthanathu Sree, S., Van Hove, R., Devloo-Casier, K., Baklanov, M., Martens, J., & Detavernier, C. (2011). Characterization of ALD coatings in nanoporous thin films by ellipsometric porosimetry. Atomic Layer Deposition, 11th International conference, Abstracts. Presented at the 11th International conference on Atomic Layer Deposition (ALD 2011).
Vancouver
1.
Dendooven J, Pulinthanathu Sree S, Van Hove R, Devloo-Casier K, Baklanov M, Martens J, et al. Characterization of ALD coatings in nanoporous thin films by ellipsometric porosimetry. Atomic Layer Deposition, 11th International conference, Abstracts. 2011.
MLA
Dendooven, Jolien, Sreeprasanth Pulinthanathu Sree, Robbert Van Hove, et al. “Characterization of ALD Coatings in Nanoporous Thin Films by Ellipsometric Porosimetry.” Atomic Layer Deposition, 11th International Conference, Abstracts. 2011. Print.
@inproceedings{4360917,
  author       = {Dendooven, Jolien and Pulinthanathu Sree, Sreeprasanth and Van Hove, Robbert and Devloo-Casier, Kilian and Baklanov, Mikhail and Martens, Johan and Detavernier, Christophe},
  booktitle    = {Atomic Layer Deposition, 11th International conference, Abstracts},
  language     = {eng},
  location     = {Cambridge, MA, USA},
  title        = {Characterization of ALD coatings in nanoporous thin films by ellipsometric porosimetry},
  year         = {2011},
}