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On the growth kinetics of Ni(Pt) silicide thin films

J Demeulemeester, D Smeets, CM Comrie, NP Barradas, A Vieira, Charlotte Van Bockstael, Christophe Detavernier UGent, K Temst and A Vantomme (2013) JOURNAL OF APPLIED PHYSICS. 113(16).
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
PHASE-FORMATION, THERMAL-STABILITY, NISI FILMS, NI2SI, RESISTANCE MEASUREMENTS, RUTHERFORD BACKSCATTERING DATA, DIFFUSION MECHANISMS, MARKER, SI(100), ELEMENTS
journal title
JOURNAL OF APPLIED PHYSICS
J. Appl. Phys.
volume
113
issue
16
article number
163504
pages
8 pages
Web of Science type
Article
Web of Science id
000318550300017
JCR category
PHYSICS, APPLIED
JCR impact factor
2.185 (2013)
JCR rank
39/136 (2013)
JCR quartile
2 (2013)
ISSN
0021-8979
DOI
10.1063/1.4802738
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
4357555
handle
http://hdl.handle.net/1854/LU-4357555
date created
2014-04-08 22:19:14
date last changed
2016-12-21 15:42:42
@article{4357555,
  articleno    = {163504},
  author       = {Demeulemeester, J and Smeets, D and Comrie, CM and Barradas, NP and Vieira, A and Van Bockstael, Charlotte and Detavernier, Christophe and Temst, K and Vantomme, A},
  issn         = {0021-8979},
  journal      = {JOURNAL OF APPLIED PHYSICS},
  keyword      = {PHASE-FORMATION,THERMAL-STABILITY,NISI FILMS,NI2SI,RESISTANCE MEASUREMENTS,RUTHERFORD BACKSCATTERING DATA,DIFFUSION MECHANISMS,MARKER,SI(100),ELEMENTS},
  language     = {eng},
  number       = {16},
  pages        = {8},
  title        = {On the growth kinetics of Ni(Pt) silicide thin films},
  url          = {http://dx.doi.org/10.1063/1.4802738},
  volume       = {113},
  year         = {2013},
}

Chicago
Demeulemeester, J, D Smeets, CM Comrie, NP Barradas, A Vieira, Charlotte Van Bockstael, Christophe Detavernier, K Temst, and A Vantomme. 2013. “On the Growth Kinetics of Ni(Pt) Silicide Thin Films.” Journal of Applied Physics 113 (16).
APA
Demeulemeester, J, Smeets, D., Comrie, C., Barradas, N., Vieira, A., Van Bockstael, C., Detavernier, C., et al. (2013). On the growth kinetics of Ni(Pt) silicide thin films. JOURNAL OF APPLIED PHYSICS, 113(16).
Vancouver
1.
Demeulemeester J, Smeets D, Comrie C, Barradas N, Vieira A, Van Bockstael C, et al. On the growth kinetics of Ni(Pt) silicide thin films. JOURNAL OF APPLIED PHYSICS. 2013;113(16).
MLA
Demeulemeester, J, D Smeets, CM Comrie, et al. “On the Growth Kinetics of Ni(Pt) Silicide Thin Films.” JOURNAL OF APPLIED PHYSICS 113.16 (2013): n. pag. Print.