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On the nucleation of PdSi and NiSi2 during the ternary Ni(Pd)/Si(100) reaction

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Keywords
NI, (111)SI, THIN-FILMS, MIXING ENTROPY, THERMAL-STABILITY, SILICIDE FORMATION, PHASE-TRANSFORMATION, BILAYERS, DIFFUSION

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Chicago
Schrauwen, A, J Demeulemeester, A Kumar, W Vandervorst, CM Comrie, Christophe Detavernier, K Temst, and A Vantomme. 2013. “On the Nucleation of PdSi and NiSi2 During the Ternary Ni(Pd)/Si(100) Reaction.” Journal of Applied Physics 114 (6).
APA
Schrauwen, A., Demeulemeester, J., Kumar, A., Vandervorst, W., Comrie, C., Detavernier, C., Temst, K., et al. (2013). On the nucleation of PdSi and NiSi2 during the ternary Ni(Pd)/Si(100) reaction. JOURNAL OF APPLIED PHYSICS, 114(6).
Vancouver
1.
Schrauwen A, Demeulemeester J, Kumar A, Vandervorst W, Comrie C, Detavernier C, et al. On the nucleation of PdSi and NiSi2 during the ternary Ni(Pd)/Si(100) reaction. JOURNAL OF APPLIED PHYSICS. 2013;114(6).
MLA
Schrauwen, A, J Demeulemeester, A Kumar, et al. “On the Nucleation of PdSi and NiSi2 During the Ternary Ni(Pd)/Si(100) Reaction.” JOURNAL OF APPLIED PHYSICS 114.6 (2013): n. pag. Print.
@article{4357486,
  articleno    = {063518},
  author       = {Schrauwen, A and Demeulemeester, J and Kumar, A and Vandervorst, W and Comrie, CM and Detavernier, Christophe and Temst, K and Vantomme, A},
  issn         = {0021-8979},
  journal      = {JOURNAL OF APPLIED PHYSICS},
  language     = {eng},
  number       = {6},
  pages        = {5},
  title        = {On the nucleation of PdSi and NiSi2 during the ternary Ni(Pd)/Si(100) reaction},
  url          = {http://dx.doi.org/10.1063/1.4818333},
  volume       = {114},
  year         = {2013},
}

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