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Influence of oxygen flow and film thickness on the texture and microstructure of sputtered ceria thin films

Sigelinde Van Steenberge (UGent) , Wouter Leroy (UGent) and Diederik Depla (UGent)
(2014) THIN SOLID FILMS. 553. p.2-6
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Keywords
Preferential orientation, Energy per arriving atom, Magnetron sputtering, CeO2 thin films, OXIDE FUEL-CELLS, ELECTRICAL-PROPERTIES, DEPOSITION, TARGET, ELECTROLYTE, COMPONENTS, COATINGS, GROWTH, SENSOR, SOFC

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Citation

Please use this url to cite or link to this publication:

Chicago
Van Steenberge, Sigelinde, Wouter Leroy, and Diederik Depla. 2014. “Influence of Oxygen Flow and Film Thickness on the Texture and Microstructure of Sputtered Ceria Thin Films.” Thin Solid Films 553: 2–6.
APA
Van Steenberge, S., Leroy, W., & Depla, D. (2014). Influence of oxygen flow and film thickness on the texture and microstructure of sputtered ceria thin films. THIN SOLID FILMS, 553, 2–6.
Vancouver
1.
Van Steenberge S, Leroy W, Depla D. Influence of oxygen flow and film thickness on the texture and microstructure of sputtered ceria thin films. THIN SOLID FILMS. 2014;553:2–6.
MLA
Van Steenberge, Sigelinde, Wouter Leroy, and Diederik Depla. “Influence of Oxygen Flow and Film Thickness on the Texture and Microstructure of Sputtered Ceria Thin Films.” THIN SOLID FILMS 553 (2014): 2–6. Print.
@article{4307076,
  author       = {Van Steenberge, Sigelinde and Leroy, Wouter and Depla, Diederik},
  issn         = {0040-6090},
  journal      = {THIN SOLID FILMS},
  language     = {eng},
  pages        = {2--6},
  title        = {Influence of oxygen flow and film thickness on the texture and microstructure of sputtered ceria thin films},
  url          = {http://dx.doi.org/10.1016/j.tsf.2013.11.049},
  volume       = {553},
  year         = {2014},
}

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