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Influencing the hysteresis during reactive magnetron sputtering by gas separation

Diederik Depla (UGent) , Johan Haemers (UGent) and Roger De Gryse (UGent)
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Keywords
DISCHARGE VOLTAGE, RAREFACTION, Hysteresis, DEPOSITION, MODEL, Gas separation, Reactive sputtering

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Citation

Please use this url to cite or link to this publication:

Chicago
Depla, Diederik, Johan Haemers, and Roger De Gryse. 2013. “Influencing the Hysteresis During Reactive Magnetron Sputtering by Gas Separation.” Surface & Coatings Technology 235: 62–67.
APA
Depla, D., Haemers, J., & De Gryse, R. (2013). Influencing the hysteresis during reactive magnetron sputtering by gas separation. SURFACE & COATINGS TECHNOLOGY, 235, 62–67.
Vancouver
1.
Depla D, Haemers J, De Gryse R. Influencing the hysteresis during reactive magnetron sputtering by gas separation. SURFACE & COATINGS TECHNOLOGY. 2013;235:62–7.
MLA
Depla, Diederik, Johan Haemers, and Roger De Gryse. “Influencing the Hysteresis During Reactive Magnetron Sputtering by Gas Separation.” SURFACE & COATINGS TECHNOLOGY 235 (2013): 62–67. Print.
@article{4267693,
  author       = {Depla, Diederik and Haemers, Johan and De Gryse, Roger},
  issn         = {0257-8972},
  journal      = {SURFACE \& COATINGS TECHNOLOGY},
  language     = {eng},
  pages        = {62--67},
  title        = {Influencing the hysteresis during reactive magnetron sputtering by gas separation},
  url          = {http://dx.doi.org/10.1016/j.surfcoat.2013.07.012},
  volume       = {235},
  year         = {2013},
}

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