Analysis of oxygen thermal donor formation in n-type Cz silicon
- Author
- JM RAFI, E SIMOEN, C CLAEYS, AG ULYASHIN, R JOB, WR FAHRNER, Jorg Versluys, Paul Clauws (UGent) , M LOZANO and F CAMPABADAL
- Organization
Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-410745
- MLA
- RAFI, JM, E SIMOEN, C CLAEYS, et al. “Analysis of Oxygen Thermal Donor Formation in N-type Cz Silicon.” ANALYTICAL AND DIAGNOSTIC TECHNIQUES FOR SEMICONDUCTOR MATERIALS, DEVICES, AND PROCESSES 2003.3 (2003): 96–105. Print.
- APA
- RAFI, JM, SIMOEN, E., CLAEYS, C., ULYASHIN, A., JOB, R., FAHRNER, W., Versluys, J., et al. (2003). Analysis of oxygen thermal donor formation in n-type Cz silicon. ANALYTICAL AND DIAGNOSTIC TECHNIQUES FOR SEMICONDUCTOR MATERIALS, DEVICES, AND PROCESSES, 2003(3), 96–105.
- Chicago author-date
- RAFI, JM, E SIMOEN, C CLAEYS, AG ULYASHIN, R JOB, WR FAHRNER, Jorg Versluys, Paul Clauws, M LOZANO, and F CAMPABADAL. 2003. “Analysis of Oxygen Thermal Donor Formation in N-type Cz Silicon.” Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes 2003 (3): 96–105.
- Chicago author-date (all authors)
- RAFI, JM, E SIMOEN, C CLAEYS, AG ULYASHIN, R JOB, WR FAHRNER, Jorg Versluys, Paul Clauws, M LOZANO, and F CAMPABADAL. 2003. “Analysis of Oxygen Thermal Donor Formation in N-type Cz Silicon.” Analytical and Diagnostic Techniques for Semiconductor Materials, Devices, and Processes 2003 (3): 96–105.
- Vancouver
- 1.RAFI J, SIMOEN E, CLAEYS C, ULYASHIN A, JOB R, FAHRNER W, et al. Analysis of oxygen thermal donor formation in n-type Cz silicon. ANALYTICAL AND DIAGNOSTIC TECHNIQUES FOR SEMICONDUCTOR MATERIALS, DEVICES, AND PROCESSES. 2003;2003(3):96–105.
- IEEE
- [1]J. RAFI et al., “Analysis of oxygen thermal donor formation in n-type Cz silicon,” ANALYTICAL AND DIAGNOSTIC TECHNIQUES FOR SEMICONDUCTOR MATERIALS, DEVICES, AND PROCESSES, vol. 2003, no. 3, pp. 96–105, 2003.
@article{410745,
author = {RAFI, JM and SIMOEN, E and CLAEYS, C and ULYASHIN, AG and JOB, R and FAHRNER, WR and Versluys, Jorg and Clauws, Paul and LOZANO, M and CAMPABADAL, F},
journal = {ANALYTICAL AND DIAGNOSTIC TECHNIQUES FOR SEMICONDUCTOR MATERIALS, DEVICES, AND PROCESSES},
language = {eng},
number = {3},
pages = {96--105},
title = {Analysis of oxygen thermal donor formation in n-type Cz silicon},
volume = {2003},
year = {2003},
}