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Plasma-enhanced chemical vapour deposition growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth

F IACOPI, PM VEREECKEN, M SCHAEKERS, M CAYMAX, N MOELANS, B BLANPAIN, O RICHARD, Christophe Detavernier UGent and H GRIFFITHS (2007) NANOTECHNOLOGY. 18(50).
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle
publication status
published
subject
journal title
NANOTECHNOLOGY
Nanotechnology
volume
18
issue
50
Web of Science type
Article
Web of Science id
000252745600010
JCR category
ENGINEERING, MULTIDISCIPLINARY
JCR impact factor
3.31 (2007)
JCR rank
2/65 (2007)
JCR quartile
1 (2007)
ISSN
0957-4484
language
English
UGent publication?
yes
classification
A1
id
408831
handle
http://hdl.handle.net/1854/LU-408831
date created
2008-05-15 11:40:00
date last changed
2008-05-16 16:48:52
@article{408831,
  author       = {IACOPI, F and VEREECKEN, PM and SCHAEKERS, M and CAYMAX, M and MOELANS, N and BLANPAIN, B and RICHARD, O and Detavernier, Christophe and GRIFFITHS, H},
  issn         = {0957-4484},
  journal      = {NANOTECHNOLOGY},
  language     = {eng},
  number       = {50},
  title        = {Plasma-enhanced chemical vapour deposition growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth},
  volume       = {18},
  year         = {2007},
}

Chicago
IACOPI, F, PM VEREECKEN, M SCHAEKERS, M CAYMAX, N MOELANS, B BLANPAIN, O RICHARD, Christophe Detavernier, and H GRIFFITHS. 2007. “Plasma-enhanced Chemical Vapour Deposition Growth of Si Nanowires with Low Melting Point Metal Catalysts: An Effective Alternative to Au-mediated Growth.” Nanotechnology 18 (50).
APA
IACOPI, F., VEREECKEN, P., SCHAEKERS, M., CAYMAX, M., MOELANS, N., BLANPAIN, B., RICHARD, O., et al. (2007). Plasma-enhanced chemical vapour deposition growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth. NANOTECHNOLOGY, 18(50).
Vancouver
1.
IACOPI F, VEREECKEN P, SCHAEKERS M, CAYMAX M, MOELANS N, BLANPAIN B, et al. Plasma-enhanced chemical vapour deposition growth of Si nanowires with low melting point metal catalysts: an effective alternative to Au-mediated growth. NANOTECHNOLOGY. 2007;18(50).
MLA
IACOPI, F, PM VEREECKEN, M SCHAEKERS, et al. “Plasma-enhanced Chemical Vapour Deposition Growth of Si Nanowires with Low Melting Point Metal Catalysts: An Effective Alternative to Au-mediated Growth.” NANOTECHNOLOGY 18.50 (2007): n. pag. Print.