Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering
- Author
- Stijn Mahieu (UGent) , Pieter Ghekiere, Griet De Winter, Roger De Gryse (UGent) , Diederik Depla (UGent) , G VAN TENDELOO and OI LEBEDEV
- Organization
Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-329108
- MLA
- Mahieu, Stijn, et al. “Biaxially Aligned Titanium Nitride Thin Films Deposited by Reactive Unbalanced Magnetron Sputtering.” SURFACE & COATINGS TECHNOLOGY, vol. 200, no. 8, ELSEVIER SCIENCE SA, 2006, pp. 2764–68.
- APA
- Mahieu, S., Ghekiere, P., De Winter, G., De Gryse, R., Depla, D., VAN TENDELOO, G., & LEBEDEV, O. (2006). Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering. SURFACE & COATINGS TECHNOLOGY, 200(8), 2764–2768.
- Chicago author-date
- Mahieu, Stijn, Pieter Ghekiere, Griet De Winter, Roger De Gryse, Diederik Depla, G VAN TENDELOO, and OI LEBEDEV. 2006. “Biaxially Aligned Titanium Nitride Thin Films Deposited by Reactive Unbalanced Magnetron Sputtering.” SURFACE & COATINGS TECHNOLOGY 200 (8): 2764–68.
- Chicago author-date (all authors)
- Mahieu, Stijn, Pieter Ghekiere, Griet De Winter, Roger De Gryse, Diederik Depla, G VAN TENDELOO, and OI LEBEDEV. 2006. “Biaxially Aligned Titanium Nitride Thin Films Deposited by Reactive Unbalanced Magnetron Sputtering.” SURFACE & COATINGS TECHNOLOGY 200 (8): 2764–2768.
- Vancouver
- 1.Mahieu S, Ghekiere P, De Winter G, De Gryse R, Depla D, VAN TENDELOO G, et al. Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering. SURFACE & COATINGS TECHNOLOGY. 2006;200(8):2764–8.
- IEEE
- [1]S. Mahieu et al., “Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering,” SURFACE & COATINGS TECHNOLOGY, vol. 200, no. 8, pp. 2764–2768, 2006.
@article{329108,
author = {{Mahieu, Stijn and Ghekiere, Pieter and De Winter, Griet and De Gryse, Roger and Depla, Diederik and VAN TENDELOO, G and LEBEDEV, OI}},
issn = {{0257-8972}},
journal = {{SURFACE & COATINGS TECHNOLOGY}},
language = {{eng}},
number = {{8}},
pages = {{2764--2768}},
publisher = {{ELSEVIER SCIENCE SA}},
title = {{Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering}},
volume = {{200}},
year = {{2006}},
}