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Nickel Silicide Technology

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Citation

Please use this url to cite or link to this publication:

MLA
LAVOIE, C, Christophe Detavernier, and P BESSER. “Nickel Silicide Technology.” Silicide Technology for Integrated Circuits. British Institution of Electrical Engineers (IEE), 2004. 95–151. Print.
APA
LAVOIE, C., Detavernier, C., & BESSER, P. (2004). Nickel Silicide Technology. Silicide Technology for Integrated Circuits (pp. 95–151). British Institution of Electrical Engineers (IEE).
Chicago author-date
LAVOIE, C, Christophe Detavernier, and P BESSER. 2004. “Nickel Silicide Technology.” In Silicide Technology for Integrated Circuits, 95–151. British Institution of Electrical Engineers (IEE).
Chicago author-date (all authors)
LAVOIE, C, Christophe Detavernier, and P BESSER. 2004. “Nickel Silicide Technology.” In Silicide Technology for Integrated Circuits, 95–151. British Institution of Electrical Engineers (IEE).
Vancouver
1.
LAVOIE C, Detavernier C, BESSER P. Nickel Silicide Technology. Silicide Technology for Integrated Circuits. British Institution of Electrical Engineers (IEE); 2004. p. 95–151.
IEEE
[1]
C. LAVOIE, C. Detavernier, and P. BESSER, “Nickel Silicide Technology,” in Silicide Technology for Integrated Circuits, British Institution of Electrical Engineers (IEE), 2004, pp. 95–151.
@incollection{326093,
  author       = {LAVOIE, C and Detavernier, Christophe and BESSER, P},
  booktitle    = {Silicide Technology for Integrated Circuits},
  isbn         = {0-86341-352-8},
  language     = {und},
  pages        = {95--151},
  publisher    = {British Institution of Electrical Engineers (IEE)},
  title        = {Nickel Silicide Technology},
  year         = {2004},
}