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Mechanism of preferential orientation in sputter deposited titanium nitride and yttria-stabilized zirconia layers

(2005) JOURNAL OF CRYSTAL GROWTH. 279(1-2). p.100-109
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Keywords
growth models, physical vapour deposition, nitrides, oxides

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Citation

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MLA
Mahieu, Stijn, et al. “Mechanism of Preferential Orientation in Sputter Deposited Titanium Nitride and Yttria-Stabilized Zirconia Layers.” JOURNAL OF CRYSTAL GROWTH, vol. 279, no. 1–2, 2005, pp. 100–09, doi:10.1016/j.jcrysgro.2005.02.014.
APA
Mahieu, S., Ghekiere, P., De Winter, G., Heirwegh, S., Depla, D., De Gryse, R., … Van Tendeloo, G. (2005). Mechanism of preferential orientation in sputter deposited titanium nitride and yttria-stabilized zirconia layers. JOURNAL OF CRYSTAL GROWTH, 279(1–2), 100–109. https://doi.org/10.1016/j.jcrysgro.2005.02.014
Chicago author-date
Mahieu, Stijn, Pieter Ghekiere, Griet De Winter, Sarah Heirwegh, Diederik Depla, Roger De Gryse, OI Lebedev, and G Van Tendeloo. 2005. “Mechanism of Preferential Orientation in Sputter Deposited Titanium Nitride and Yttria-Stabilized Zirconia Layers.” JOURNAL OF CRYSTAL GROWTH 279 (1–2): 100–109. https://doi.org/10.1016/j.jcrysgro.2005.02.014.
Chicago author-date (all authors)
Mahieu, Stijn, Pieter Ghekiere, Griet De Winter, Sarah Heirwegh, Diederik Depla, Roger De Gryse, OI Lebedev, and G Van Tendeloo. 2005. “Mechanism of Preferential Orientation in Sputter Deposited Titanium Nitride and Yttria-Stabilized Zirconia Layers.” JOURNAL OF CRYSTAL GROWTH 279 (1–2): 100–109. doi:10.1016/j.jcrysgro.2005.02.014.
Vancouver
1.
Mahieu S, Ghekiere P, De Winter G, Heirwegh S, Depla D, De Gryse R, et al. Mechanism of preferential orientation in sputter deposited titanium nitride and yttria-stabilized zirconia layers. JOURNAL OF CRYSTAL GROWTH. 2005;279(1–2):100–9.
IEEE
[1]
S. Mahieu et al., “Mechanism of preferential orientation in sputter deposited titanium nitride and yttria-stabilized zirconia layers,” JOURNAL OF CRYSTAL GROWTH, vol. 279, no. 1–2, pp. 100–109, 2005.
@article{325949,
  author       = {{Mahieu, Stijn and Ghekiere, Pieter and De Winter, Griet and Heirwegh, Sarah and Depla, Diederik and De Gryse, Roger and Lebedev, OI and Van Tendeloo, G}},
  issn         = {{0022-0248}},
  journal      = {{JOURNAL OF CRYSTAL GROWTH}},
  keywords     = {{growth models,physical vapour deposition,nitrides,oxides}},
  language     = {{eng}},
  number       = {{1-2}},
  pages        = {{100--109}},
  title        = {{Mechanism of preferential orientation in sputter deposited titanium nitride and yttria-stabilized zirconia layers}},
  url          = {{http://doi.org/10.1016/j.jcrysgro.2005.02.014}},
  volume       = {{279}},
  year         = {{2005}},
}

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