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Reactive sputter deposition of Al doped TiOx thin films using titanium targets with aluminium inserts

Bert Braeckman, Francis Boydens, Diederik Depla UGent and Dirk Poelman UGent (2013) JOURNAL OF ALLOYS AND COMPOUNDS. 578. p.44-49
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
Thin film deposition, Magnetron sputtering, Reactive sputtering behaviour, YTTRIA-STABILIZED ZIRCONIA, ION-BOMBARDMENT, VOLTAGE MEASUREMENTS, OPTICAL-PROPERTIES, TRANSITION-METALS, ANATASE TIO2, SURFACE, XPS, GAS, REDUCTION
journal title
JOURNAL OF ALLOYS AND COMPOUNDS
J. Alloy. Compd.
volume
578
pages
44 - 49
Web of Science type
Article
Web of Science id
000324316400008
JCR category
METALLURGY & METALLURGICAL ENGINEERING
JCR impact factor
2.726 (2013)
JCR rank
5/75 (2013)
JCR quartile
1 (2013)
ISSN
0925-8388
DOI
10.1016/j.jallcom.2013.05.011
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
3235618
handle
http://hdl.handle.net/1854/LU-3235618
date created
2013-06-05 10:06:35
date last changed
2016-12-19 15:45:43
@article{3235618,
  author       = {Braeckman, Bert and Boydens, Francis and Depla, Diederik and Poelman, Dirk},
  issn         = {0925-8388},
  journal      = {JOURNAL OF ALLOYS AND COMPOUNDS},
  keyword      = {Thin film deposition,Magnetron sputtering,Reactive sputtering behaviour,YTTRIA-STABILIZED ZIRCONIA,ION-BOMBARDMENT,VOLTAGE MEASUREMENTS,OPTICAL-PROPERTIES,TRANSITION-METALS,ANATASE TIO2,SURFACE,XPS,GAS,REDUCTION},
  language     = {eng},
  pages        = {44--49},
  title        = {Reactive sputter deposition of Al doped TiOx thin films using titanium targets with aluminium inserts},
  url          = {http://dx.doi.org/10.1016/j.jallcom.2013.05.011},
  volume       = {578},
  year         = {2013},
}

Chicago
Braeckman, Bert, Francis Boydens, Diederik Depla, and Dirk Poelman. 2013. “Reactive Sputter Deposition of Al Doped TiOx Thin Films Using Titanium Targets with Aluminium Inserts.” Journal of Alloys and Compounds 578: 44–49.
APA
Braeckman, Bert, Boydens, F., Depla, D., & Poelman, D. (2013). Reactive sputter deposition of Al doped TiOx thin films using titanium targets with aluminium inserts. JOURNAL OF ALLOYS AND COMPOUNDS, 578, 44–49.
Vancouver
1.
Braeckman B, Boydens F, Depla D, Poelman D. Reactive sputter deposition of Al doped TiOx thin films using titanium targets with aluminium inserts. JOURNAL OF ALLOYS AND COMPOUNDS. 2013;578:44–9.
MLA
Braeckman, Bert, Francis Boydens, Diederik Depla, et al. “Reactive Sputter Deposition of Al Doped TiOx Thin Films Using Titanium Targets with Aluminium Inserts.” JOURNAL OF ALLOYS AND COMPOUNDS 578 (2013): 44–49. Print.