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The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering

(2013) THIN SOLID FILMS. 531. p.32-41
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Keywords
Powder targets, Magnetron sputtering, Sputter yield, Angular distribution, POLYCRYSTALLINE TARGETS, ANGULAR-DISTRIBUTION, YIELDS, ATOMS, DEPENDENCE, DISCHARGE, PLASMA, FILMS, IONS

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Citation

Please use this url to cite or link to this publication:

Chicago
Boydens, Francis, Wouter Leroy, Rosita Persoons, and Diederik Depla. 2013. “The Influence of Target Surface Morphology on the Deposition Flux During Direct-current Magnetron Sputtering.” Thin Solid Films 531: 32–41.
APA
Boydens, F., Leroy, W., Persoons, R., & Depla, D. (2013). The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering. THIN SOLID FILMS, 531, 32–41.
Vancouver
1.
Boydens F, Leroy W, Persoons R, Depla D. The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering. THIN SOLID FILMS. 2013;531:32–41.
MLA
Boydens, Francis, Wouter Leroy, Rosita Persoons, et al. “The Influence of Target Surface Morphology on the Deposition Flux During Direct-current Magnetron Sputtering.” THIN SOLID FILMS 531 (2013): 32–41. Print.
@article{3201991,
  author       = {Boydens, Francis and Leroy, Wouter and Persoons, Rosita and Depla, Diederik},
  issn         = {0040-6090},
  journal      = {THIN SOLID FILMS},
  language     = {eng},
  pages        = {32--41},
  title        = {The influence of target surface morphology on the deposition flux during direct-current magnetron sputtering},
  url          = {http://dx.doi.org/10.1016/j.tsf.2012.11.097},
  volume       = {531},
  year         = {2013},
}

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