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Axiotaxy of CoSi2 thin films on Si(100) substrates and the effects of Ti alloying

(2004) JOURNAL OF APPLIED PHYSICS. 95(12). p.8376-8381
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MLA
OZCAN, AS, KF LUDWIG, Christophe Detavernier, et al. “Axiotaxy of CoSi2 Thin Films on Si(100) Substrates and the Effects of Ti Alloying.” JOURNAL OF APPLIED PHYSICS 95.12 (2004): 8376–8381. Print.
APA
OZCAN, A., LUDWIG, K., Detavernier, C., LAVOIE, C., & JORDAN-SWEET, J. (2004). Axiotaxy of CoSi2 thin films on Si(100) substrates and the effects of Ti alloying. JOURNAL OF APPLIED PHYSICS, 95(12), 8376–8381.
Chicago author-date
OZCAN, AS, KF LUDWIG, Christophe Detavernier, C LAVOIE, and JL JORDAN-SWEET. 2004. “Axiotaxy of CoSi2 Thin Films on Si(100) Substrates and the Effects of Ti Alloying.” Journal of Applied Physics 95 (12): 8376–8381.
Chicago author-date (all authors)
OZCAN, AS, KF LUDWIG, Christophe Detavernier, C LAVOIE, and JL JORDAN-SWEET. 2004. “Axiotaxy of CoSi2 Thin Films on Si(100) Substrates and the Effects of Ti Alloying.” Journal of Applied Physics 95 (12): 8376–8381.
Vancouver
1.
OZCAN A, LUDWIG K, Detavernier C, LAVOIE C, JORDAN-SWEET J. Axiotaxy of CoSi2 thin films on Si(100) substrates and the effects of Ti alloying. JOURNAL OF APPLIED PHYSICS. AMER INST PHYSICS; 2004;95(12):8376–81.
IEEE
[1]
A. OZCAN, K. LUDWIG, C. Detavernier, C. LAVOIE, and J. JORDAN-SWEET, “Axiotaxy of CoSi2 thin films on Si(100) substrates and the effects of Ti alloying,” JOURNAL OF APPLIED PHYSICS, vol. 95, no. 12, pp. 8376–8381, 2004.
@article{311980,
  author       = {OZCAN, AS and LUDWIG, KF and Detavernier, Christophe and LAVOIE, C and JORDAN-SWEET, JL},
  issn         = {0021-8979},
  journal      = {JOURNAL OF APPLIED PHYSICS},
  language     = {eng},
  number       = {12},
  pages        = {8376--8381},
  publisher    = {AMER INST PHYSICS},
  title        = {Axiotaxy of CoSi2 thin films on Si(100) substrates and the effects of Ti alloying},
  volume       = {95},
  year         = {2004},
}

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