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CoSi2 formation in the presence of Ti, Ta or W

(2004) THIN SOLID FILMS. 468(1-2). p.174-182
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MLA
Detavernier, Christophe, C LAVOIE, and Roland Vanmeirhaeghe. “CoSi2 Formation in the Presence of Ti, Ta or W.” THIN SOLID FILMS 468.1-2 (2004): 174–182. Print.
APA
Detavernier, C., LAVOIE, C., & Vanmeirhaeghe, R. (2004). CoSi2 formation in the presence of Ti, Ta or W. THIN SOLID FILMS, 468(1-2), 174–182.
Chicago author-date
Detavernier, Christophe, C LAVOIE, and Roland Vanmeirhaeghe. 2004. “CoSi2 Formation in the Presence of Ti, Ta or W.” Thin Solid Films 468 (1-2): 174–182.
Chicago author-date (all authors)
Detavernier, Christophe, C LAVOIE, and Roland Vanmeirhaeghe. 2004. “CoSi2 Formation in the Presence of Ti, Ta or W.” Thin Solid Films 468 (1-2): 174–182.
Vancouver
1.
Detavernier C, LAVOIE C, Vanmeirhaeghe R. CoSi2 formation in the presence of Ti, Ta or W. THIN SOLID FILMS. ELSEVIER SCIENCE SA; 2004;468(1-2):174–82.
IEEE
[1]
C. Detavernier, C. LAVOIE, and R. Vanmeirhaeghe, “CoSi2 formation in the presence of Ti, Ta or W,” THIN SOLID FILMS, vol. 468, no. 1–2, pp. 174–182, 2004.
@article{311939,
  author       = {Detavernier, Christophe and LAVOIE, C and Vanmeirhaeghe, Roland},
  issn         = {0040-6090},
  journal      = {THIN SOLID FILMS},
  language     = {eng},
  number       = {1-2},
  pages        = {174--182},
  publisher    = {ELSEVIER SCIENCE SA},
  title        = {CoSi2 formation in the presence of Ti, Ta or W},
  volume       = {468},
  year         = {2004},
}

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