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Application of laser ablation inductively coupled plasma (dynamic reaction cell) mass spectrometry for depth profiling analysis of high-tech industrial materials

Lieve Balcaen UGent, Jens Lenaerts, Luc Moens UGent and Frank Vanhaecke UGent (2005) JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY. 20(5). p.417-423
abstract
A 193 nm ArF excimer-based laser ablation system coupled to an inductively coupled plasma mass spectrometer equipped with a dynamic reaction cell (LA-ICP-DRC-MS) was successfully used for the depth pro. ling analysis of several (multi-layered) industrial materials characterised by markedly different ablation behaviours and sample composition. To obtain the optimum depth resolution for each of the samples, crater geometry and parameters such as laser pulse energy were studied as a function of the sample composition and layer thickness. Layers with a thickness of <1 mu m up to >200 mu m could be studied. Combining LA-ICP-MS data with results obtained by scanning electron microscopy (SEM) and profilometry allowed useful information about the crater geometry and the ablation depth per pulse to be obtained. In this way, it was possible to convert the original intensity-versus-time into intensity-versus-depth profiles and to evaluate the figures of merit of LA-ICP-MS for depth pro. ling studies. To illustrate the possibilities of the technique under investigation, depth pro. ling analysis of a thermographic material, a CsBr phosphor screen and thermal printing plates was carried out. In all cases, the spatial resolution of the laser ablation system was sufficient to differentiate between the separate layers ( even for very thin layers of +/- 1 mu m), which makes the technique suitable for studying trace element distributions and diffusion effects in several high-tech materials. Spectral interferences hampering the accurate determination of S and K in the printing plate were overcome by using chemical resolution in the DRC. The use of O-2 as a reaction gas permitted the simultaneous determination of all elements of interest (S as SO+, K as K+ and Zr as ZrO+).
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
ANALYTICAL PERFORMANCE, ICP-DRC-MS, RESOLVED ANALYSIS, IONS, SIMS
journal title
JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY
J. Anal. At. Spectrom.
volume
20
issue
5
pages
417 - 423
Web of Science type
Article
Web of Science id
000228689500006
JCR category
CHEMISTRY, ANALYTICAL
JCR impact factor
3.64 (2005)
JCR rank
4/69 (2005)
JCR quartile
1 (2005)
ISSN
0267-9477
DOI
10.1039/b412287a
language
English
UGent publication?
yes
classification
A1
id
307736
handle
http://hdl.handle.net/1854/LU-307736
date created
2005-05-23 15:44:00
date last changed
2012-11-12 12:50:50
@article{307736,
  abstract     = {A 193 nm ArF excimer-based laser ablation system coupled to an inductively coupled plasma mass spectrometer equipped with a dynamic reaction cell (LA-ICP-DRC-MS) was successfully used for the depth pro. ling analysis of several (multi-layered) industrial materials characterised by markedly different ablation behaviours and sample composition. To obtain the optimum depth resolution for each of the samples, crater geometry and parameters such as laser pulse energy were studied as a function of the sample composition and layer thickness. Layers with a thickness of {\textlangle}1 mu m up to {\textrangle}200 mu m could be studied. Combining LA-ICP-MS data with results obtained by scanning electron microscopy (SEM) and profilometry allowed useful information about the crater geometry and the ablation depth per pulse to be obtained. In this way, it was possible to convert the original intensity-versus-time into intensity-versus-depth profiles and to evaluate the figures of merit of LA-ICP-MS for depth pro. ling studies. To illustrate the possibilities of the technique under investigation, depth pro. ling analysis of a thermographic material, a CsBr phosphor screen and thermal printing plates was carried out. In all cases, the spatial resolution of the laser ablation system was sufficient to differentiate between the separate layers ( even for very thin layers of +/- 1 mu m), which makes the technique suitable for studying trace element distributions and diffusion effects in several high-tech materials. Spectral interferences hampering the accurate determination of S and K in the printing plate were overcome by using chemical resolution in the DRC. The use of O-2 as a reaction gas permitted the simultaneous determination of all elements of interest (S as SO+, K as K+ and Zr as ZrO+).},
  author       = {Balcaen, Lieve and Lenaerts, Jens and Moens, Luc and Vanhaecke, Frank},
  issn         = {0267-9477},
  journal      = {JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY},
  keyword      = {ANALYTICAL PERFORMANCE,ICP-DRC-MS,RESOLVED ANALYSIS,IONS,SIMS},
  language     = {eng},
  number       = {5},
  pages        = {417--423},
  title        = {Application of laser ablation inductively coupled plasma (dynamic reaction cell) mass spectrometry for depth profiling analysis of high-tech industrial materials},
  url          = {http://dx.doi.org/10.1039/b412287a},
  volume       = {20},
  year         = {2005},
}

Chicago
Balcaen, Lieve, Jens Lenaerts, Luc Moens, and Frank Vanhaecke. 2005. “Application of Laser Ablation Inductively Coupled Plasma (dynamic Reaction Cell) Mass Spectrometry for Depth Profiling Analysis of High-tech Industrial Materials.” Journal of Analytical Atomic Spectrometry 20 (5): 417–423.
APA
Balcaen, L., Lenaerts, J., Moens, L., & Vanhaecke, F. (2005). Application of laser ablation inductively coupled plasma (dynamic reaction cell) mass spectrometry for depth profiling analysis of high-tech industrial materials. JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY, 20(5), 417–423.
Vancouver
1.
Balcaen L, Lenaerts J, Moens L, Vanhaecke F. Application of laser ablation inductively coupled plasma (dynamic reaction cell) mass spectrometry for depth profiling analysis of high-tech industrial materials. JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY. 2005;20(5):417–23.
MLA
Balcaen, Lieve, Jens Lenaerts, Luc Moens, et al. “Application of Laser Ablation Inductively Coupled Plasma (dynamic Reaction Cell) Mass Spectrometry for Depth Profiling Analysis of High-tech Industrial Materials.” JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY 20.5 (2005): 417–423. Print.