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Modeling of the target surface modification by reactive ion implantation during magnetron sputtering

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Chicago
Depla, Diederik, ZY CHEN, A BOGAERTS, V IGNATOVA, Roger De Gryse, and R GIJBELS. 2004. “Modeling of the Target Surface Modification by Reactive Ion Implantation During Magnetron Sputtering.” Journal of Vacuum Science & Technology A 22 (4): 1524–1529.
APA
Depla, D., CHEN, Z., BOGAERTS, A., IGNATOVA, V., De Gryse, R., & GIJBELS, R. (2004). Modeling of the target surface modification by reactive ion implantation during magnetron sputtering. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 22(4), 1524–1529.
Vancouver
1.
Depla D, CHEN Z, BOGAERTS A, IGNATOVA V, De Gryse R, GIJBELS R. Modeling of the target surface modification by reactive ion implantation during magnetron sputtering. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A. A V S AMER INST PHYSICS; 2004;22(4):1524–9.
MLA
Depla, Diederik, ZY CHEN, A BOGAERTS, et al. “Modeling of the Target Surface Modification by Reactive Ion Implantation During Magnetron Sputtering.” JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A 22.4 (2004): 1524–1529. Print.
@article{298700,
  author       = {Depla, Diederik and CHEN, ZY and BOGAERTS, A and IGNATOVA, V and De Gryse, Roger and GIJBELS, R},
  issn         = {0734-2101},
  journal      = {JOURNAL OF VACUUM SCIENCE \& TECHNOLOGY A},
  language     = {eng},
  number       = {4},
  pages        = {1524--1529},
  publisher    = {A V S AMER INST PHYSICS},
  title        = {Modeling of the target surface modification by reactive ion implantation during magnetron sputtering},
  volume       = {22},
  year         = {2004},
}

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