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Plasma polymerisation of siloxanes at atmospheric pressure

(2011) SURFACE ENGINEERING. 27(8). p.627-633
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Abstract
This work deals with the plasma polymerisation of two siloxane precursors, [hexamethyldisiloxane (HMDSO) and tetramethyldisiloxane (TMDSO)] with an atmospheric pressure pseudoglow dielectric barrier discharge operated in argon and an argon-air mixture. The influence of gas composition and precursor type on the physical and chemical properties of the deposited films is examined in detail using contact angle measurements, Fourier transform infrared spectroscopy (FTIR) and atomic force microscopy (AFM). Results clearly show that precursor type as well as gas composition has an profound impact on film growth rate and chemical composition of the deposited films. Plasma polymerisation of both siloxane precursors in argon leads to the formation of hydrophobic polymers consisting of a Si-O-Si backbone, while for deposition in an argon-air mixture, hydrophilic inorganic silica-like coatings are obtained.
Keywords
Tetramethyldisiloxane, Dielectric barrier discharge, POLYETHYLENE TEREPHTHALATE, Atmospheric pressure, SURFACE-TREATMENT, THIN-FILMS, GLOW-DISCHARGE, DIELECTRIC BARRIER DISCHARGE, SIOX FILMS, DEPOSITION, HELIUM, COATINGS, TETRAETHOXYSILANE, Hexamethyldisiloxane, Plasma polymerisation

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Chicago
De Geyter, Nathalie, Rino Morent, Sandra Van Vlierberghe, Peter Dubruel, Christophe Leys, and Etienne Schacht. 2011. “Plasma Polymerisation of Siloxanes at Atmospheric Pressure.” Surface Engineering 27 (8): 627–633.
APA
De Geyter, Nathalie, Morent, R., Van Vlierberghe, S., Dubruel, P., Leys, C., & Schacht, E. (2011). Plasma polymerisation of siloxanes at atmospheric pressure. SURFACE ENGINEERING, 27(8), 627–633.
Vancouver
1.
De Geyter N, Morent R, Van Vlierberghe S, Dubruel P, Leys C, Schacht E. Plasma polymerisation of siloxanes at atmospheric pressure. SURFACE ENGINEERING. 2011;27(8):627–33.
MLA
De Geyter, Nathalie, Rino Morent, Sandra Van Vlierberghe, et al. “Plasma Polymerisation of Siloxanes at Atmospheric Pressure.” SURFACE ENGINEERING 27.8 (2011): 627–633. Print.
@article{2957043,
  abstract     = {This work deals with the plasma polymerisation of two siloxane precursors, [hexamethyldisiloxane (HMDSO) and tetramethyldisiloxane (TMDSO)] with an atmospheric pressure pseudoglow dielectric barrier discharge operated in argon and an argon-air mixture. The influence of gas composition and precursor type on the physical and chemical properties of the deposited films is examined in detail using contact angle measurements, Fourier transform infrared spectroscopy (FTIR) and atomic force microscopy (AFM). Results clearly show that precursor type as well as gas composition has an profound impact on film growth rate and chemical composition of the deposited films. Plasma polymerisation of both siloxane precursors in argon leads to the formation of hydrophobic polymers consisting of a Si-O-Si backbone, while for deposition in an argon-air mixture, hydrophilic inorganic silica-like coatings are obtained.},
  author       = {De Geyter, Nathalie and Morent, Rino and Van Vlierberghe, Sandra and Dubruel, Peter and Leys, Christophe and Schacht, Etienne},
  issn         = {0267-0844},
  journal      = {SURFACE ENGINEERING},
  keyword      = {Tetramethyldisiloxane,Dielectric barrier discharge,POLYETHYLENE TEREPHTHALATE,Atmospheric pressure,SURFACE-TREATMENT,THIN-FILMS,GLOW-DISCHARGE,DIELECTRIC BARRIER DISCHARGE,SIOX FILMS,DEPOSITION,HELIUM,COATINGS,TETRAETHOXYSILANE,Hexamethyldisiloxane,Plasma polymerisation},
  language     = {eng},
  number       = {8},
  pages        = {627--633},
  title        = {Plasma polymerisation of siloxanes at atmospheric pressure},
  url          = {http://dx.doi.org/10.1179/174329409X433858},
  volume       = {27},
  year         = {2011},
}

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