Low pressure chemical vapour deposition of polycrystalline silicon: validation and assessment of reactor models
- Author
- WLM WEERTS, M DE CROON and Guy Marin (UGent)
- Organization
Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-264558
- MLA
- WEERTS, WLM, et al. “Low Pressure Chemical Vapour Deposition of Polycrystalline Silicon: Validation and Assessment of Reactor Models.” Chem. Eng. Sc, 51, Pp. 2109-2118, 6 Figg., 1 Tab, 1996.
- APA
- WEERTS, W., DE CROON, M., & Marin, G. (1996). Low pressure chemical vapour deposition of polycrystalline silicon: validation and assessment of reactor models.
- Chicago author-date
- WEERTS, WLM, M DE CROON, and Guy Marin. 1996. “Low Pressure Chemical Vapour Deposition of Polycrystalline Silicon: Validation and Assessment of Reactor Models.” Chem. Eng. Sc, 51, Pp. 2109-2118, 6 Figg., 1 Tab.
- Chicago author-date (all authors)
- WEERTS, WLM, M DE CROON, and Guy Marin. 1996. “Low Pressure Chemical Vapour Deposition of Polycrystalline Silicon: Validation and Assessment of Reactor Models.” Chem. Eng. Sc, 51, Pp. 2109-2118, 6 Figg., 1 Tab.
- Vancouver
- 1.WEERTS W, DE CROON M, Marin G. Low pressure chemical vapour deposition of polycrystalline silicon: validation and assessment of reactor models. Chem. Eng. Sc, 51, pp. 2109-2118, 6 figg., 1 tab. 1996.
- IEEE
- [1]W. WEERTS, M. DE CROON, and G. Marin, “Low pressure chemical vapour deposition of polycrystalline silicon: validation and assessment of reactor models,” Chem. Eng. Sc, 51, pp. 2109-2118, 6 figg., 1 tab. 1996.
@misc{264558,
author = {{WEERTS, WLM and DE CROON, M and Marin, Guy}},
language = {{eng}},
series = {{Chem. Eng. Sc, 51, pp. 2109-2118, 6 figg., 1 tab}},
title = {{Low pressure chemical vapour deposition of polycrystalline silicon: validation and assessment of reactor models}},
year = {{1996}},
}