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Optimization and reliability of epitaxial lift-off for OEIC fabrication. Summer Topicals on Integrated Optoelectronics, Santa Barbara, USA, 5-7 Aug. 1992, pp. 77-78.

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Chicago
Pollentier, Ivan, Piet Demeester, Peter Van Daele, and Luc Martens. “Optimization and Reliability of Epitaxial Lift-off for OEIC Fabrication. Summer Topicals on Integrated Optoelectronics, Santa Barbara, USA, 5-7 Aug. 1992, Pp. 77-78.” In .
APA
Pollentier, I., Demeester, P., Van Daele, P., & Martens, L. (n.d.). Optimization and reliability of epitaxial lift-off for OEIC fabrication. Summer Topicals on Integrated Optoelectronics, Santa Barbara, USA, 5-7 Aug. 1992, pp. 77-78.
Vancouver
1.
Pollentier I, Demeester P, Van Daele P, Martens L. Optimization and reliability of epitaxial lift-off for OEIC fabrication. Summer Topicals on Integrated Optoelectronics, Santa Barbara, USA, 5-7 Aug. 1992, pp. 77-78.
MLA
Pollentier, Ivan, Piet Demeester, Peter Van Daele, et al. “Optimization and Reliability of Epitaxial Lift-off for OEIC Fabrication. Summer Topicals on Integrated Optoelectronics, Santa Barbara, USA, 5-7 Aug. 1992, Pp. 77-78.” Print.
@inproceedings{225959,
  author       = {Pollentier, Ivan and Demeester, Piet and Van Daele, Peter and Martens, Luc},
  language     = {eng},
  title        = {Optimization and reliability of epitaxial lift-off for OEIC fabrication. Summer Topicals on Integrated Optoelectronics, Santa Barbara, USA, 5-7 Aug. 1992, pp. 77-78.},
}