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Titanium silicide p-Si Schottky barriers formed by rapid thermal processing in nitrogen

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Chicago
DE BOSSCHER, W, Roland Vanmeirhaeghe, Willy Laflere, and Felix Cardon. 1991. “Titanium Silicide p-Si Schottky Barriers Formed by Rapid Thermal Processing in Nitrogen.” Soc. St. Electron, 34(8), Pp. 827-834, 11 Figg.
APA
DE BOSSCHER, W., Vanmeirhaeghe, R., Laflere, W., & Cardon, F. (1991). Titanium silicide p-Si Schottky barriers formed by rapid thermal processing in nitrogen. Soc. St. Electron, 34(8), pp. 827-834, 11 figg.
Vancouver
1.
DE BOSSCHER W, Vanmeirhaeghe R, Laflere W, Cardon F. Titanium silicide p-Si Schottky barriers formed by rapid thermal processing in nitrogen. Soc. St. Electron, 34(8), pp. 827-834, 11 figg. 1991;
MLA
DE BOSSCHER, W, Roland Vanmeirhaeghe, Willy Laflere, et al. “Titanium Silicide p-Si Schottky Barriers Formed by Rapid Thermal Processing in Nitrogen.” Soc. St. Electron, 34(8), pp. 827-834, 11 figg (1991): n. pag. Print.
@article{220998,
  author       = {DE BOSSCHER, W and Vanmeirhaeghe, Roland and Laflere, Willy and Cardon, Felix},
  journal      = {Soc. St. Electron, 34(8), pp. 827-834, 11 figg},
  language     = {eng},
  title        = {Titanium silicide p-Si Schottky barriers formed by rapid thermal processing in nitrogen},
  year         = {1991},
}