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In-situ monitoring of thin film reactions during rapid thermal annealing: nickel silicide formation

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Chicago
LAVOIE, C, R PURTELL, C COIA, Christophe Detavernier, P DESJARDINS, J JORDAN-SWEET, C CABRAL, F D’HEURLE, and J HARPER. 2003. “In-situ Monitoring of Thin Film Reactions During Rapid Thermal Annealing: Nickel Silicide Formation.” In Rapid Thermal and Other Short-Time Processing Technologies III - Proceedings PV 2002-11, 455–469.
APA
LAVOIE, C., PURTELL, R., COIA, C., Detavernier, C., DESJARDINS, P., JORDAN-SWEET, J., CABRAL, C., et al. (2003). In-situ monitoring of thin film reactions during rapid thermal annealing: nickel silicide formation. Rapid Thermal and Other Short-Time Processing Technologies III - Proceedings PV 2002-11 (pp. 455–469).
Vancouver
1.
LAVOIE C, PURTELL R, COIA C, Detavernier C, DESJARDINS P, JORDAN-SWEET J, et al. In-situ monitoring of thin film reactions during rapid thermal annealing: nickel silicide formation. Rapid Thermal and Other Short-Time Processing Technologies III - Proceedings PV 2002-11. 2003. p. 455–69.
MLA
LAVOIE, C, R PURTELL, C COIA, et al. “In-situ Monitoring of Thin Film Reactions During Rapid Thermal Annealing: Nickel Silicide Formation.” Rapid Thermal and Other Short-Time Processing Technologies III - Proceedings PV 2002-11. 2003. 455–469. Print.
@inproceedings{216688,
  author       = {LAVOIE, C and PURTELL, R and COIA, C and Detavernier, Christophe and DESJARDINS, P and JORDAN-SWEET, J and CABRAL, C and D'HEURLE, F and HARPER, J},
  booktitle    = {Rapid Thermal and Other Short-Time Processing Technologies III - Proceedings PV 2002-11},
  pages        = {455--469},
  title        = {In-situ monitoring of thin film reactions during rapid thermal annealing: nickel silicide formation},
  year         = {2003},
}