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Kinetics of agglomeration of NiSi and NiSi2 phase formation

Christophe Detavernier UGent, A OZCAN, C LAVOIE, J HARPER and J JORDAN-SWEET (2003) Novel Materials and Processes for Advanced CMOS, Vol. 745. p.135-140
Please use this url to cite or link to this publication:
author
organization
year
type
conference
publication status
published
subject
in
Novel Materials and Processes for Advanced CMOS, Vol. 745
pages
135-140 pages
UGent publication?
yes
classification
C1
id
216682
handle
http://hdl.handle.net/1854/LU-216682
date created
2004-05-13 12:42:00
date last changed
2016-12-19 15:36:16
@inproceedings{216682,
  author       = {Detavernier, Christophe and OZCAN, A and LAVOIE, C and HARPER, J and JORDAN-SWEET, J},
  booktitle    = {Novel Materials and Processes for Advanced CMOS, Vol. 745},
  pages        = {135--140},
  title        = {Kinetics of agglomeration of NiSi and NiSi2 phase formation},
  year         = {2003},
}

Chicago
Detavernier, Christophe, A OZCAN, C LAVOIE, J HARPER, and J JORDAN-SWEET. 2003. “Kinetics of Agglomeration of NiSi and NiSi2 Phase Formation.” In Novel Materials and Processes for Advanced CMOS, Vol. 745, 135–140.
APA
Detavernier, C., OZCAN, A., LAVOIE, C., HARPER, J., & JORDAN-SWEET, J. (2003). Kinetics of agglomeration of NiSi and NiSi2 phase formation. Novel Materials and Processes for Advanced CMOS, Vol. 745 (pp. 135–140).
Vancouver
1.
Detavernier C, OZCAN A, LAVOIE C, HARPER J, JORDAN-SWEET J. Kinetics of agglomeration of NiSi and NiSi2 phase formation. Novel Materials and Processes for Advanced CMOS, Vol. 745. 2003. p. 135–40.
MLA
Detavernier, Christophe, A OZCAN, C LAVOIE, et al. “Kinetics of Agglomeration of NiSi and NiSi2 Phase Formation.” Novel Materials and Processes for Advanced CMOS, Vol. 745. 2003. 135–140. Print.