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Thermal expansion of the isostructural PtSi and NiSi: Negative expansion coefficient in NiSi and stress effects in thin films

(2003) JOURNAL OF APPLIED PHYSICS. 93(5). p.2510-2515
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MLA
Detavernier, Christophe, C LAVOIE, and FM D’HEURLE. “Thermal Expansion of the Isostructural PtSi and NiSi: Negative Expansion Coefficient in NiSi and Stress Effects in Thin Films.” JOURNAL OF APPLIED PHYSICS 93.5 (2003): 2510–2515. Print.
APA
Detavernier, C., LAVOIE, C., & D’HEURLE, F. (2003). Thermal expansion of the isostructural PtSi and NiSi: Negative expansion coefficient in NiSi and stress effects in thin films. JOURNAL OF APPLIED PHYSICS, 93(5), 2510–2515.
Chicago author-date
Detavernier, Christophe, C LAVOIE, and FM D’HEURLE. 2003. “Thermal Expansion of the Isostructural PtSi and NiSi: Negative Expansion Coefficient in NiSi and Stress Effects in Thin Films.” Journal of Applied Physics 93 (5): 2510–2515.
Chicago author-date (all authors)
Detavernier, Christophe, C LAVOIE, and FM D’HEURLE. 2003. “Thermal Expansion of the Isostructural PtSi and NiSi: Negative Expansion Coefficient in NiSi and Stress Effects in Thin Films.” Journal of Applied Physics 93 (5): 2510–2515.
Vancouver
1.
Detavernier C, LAVOIE C, D’HEURLE F. Thermal expansion of the isostructural PtSi and NiSi: Negative expansion coefficient in NiSi and stress effects in thin films. JOURNAL OF APPLIED PHYSICS. AMER INST PHYSICS; 2003;93(5):2510–5.
IEEE
[1]
C. Detavernier, C. LAVOIE, and F. D’HEURLE, “Thermal expansion of the isostructural PtSi and NiSi: Negative expansion coefficient in NiSi and stress effects in thin films,” JOURNAL OF APPLIED PHYSICS, vol. 93, no. 5, pp. 2510–2515, 2003.
@article{216638,
  author       = {Detavernier, Christophe and LAVOIE, C and D'HEURLE, FM},
  issn         = {0021-8979},
  journal      = {JOURNAL OF APPLIED PHYSICS},
  language     = {eng},
  number       = {5},
  pages        = {2510--2515},
  publisher    = {AMER INST PHYSICS},
  title        = {Thermal expansion of the isostructural PtSi and NiSi: Negative expansion coefficient in NiSi and stress effects in thin films},
  volume       = {93},
  year         = {2003},
}

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