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In situ study of the growth properties of Ni-rare earth silicides for interlayer and alloy systems on Si(100)

J Demeulemeester, Werner Knaepen UGent, D Smeets, A Schrauwen, CM Comrie, NP Barradas, A Vieira, Christophe Detavernier UGent, K Temst and A Vantomme (2012) JOURNAL OF APPLIED PHYSICS. 111(4).
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
THIN-FILMS, INTERMETALLIC COMPOUNDS, RUTHERFORD BACKSCATTERING DATA, DIFFUSION MECHANISMS, THERMAL-EXPANSION, SCHOTTKY-BARRIER, NICKEL SILICIDE, ERBIUM, MARKER, METALS
journal title
JOURNAL OF APPLIED PHYSICS
J. Appl. Phys.
volume
111
issue
4
article_number
043511
pages
13 pages
Web of Science type
Article
Web of Science id
000300948600028
JCR category
PHYSICS, APPLIED
JCR impact factor
2.21 (2012)
JCR rank
31/127 (2012)
JCR quartile
1 (2012)
ISSN
0021-8979
DOI
10.1063/1.3681331
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
2154270
handle
http://hdl.handle.net/1854/LU-2154270
date created
2012-06-14 17:25:15
date last changed
2012-06-29 14:27:40
@article{2154270,
  articleno    = {043511},
  author       = {Demeulemeester, J and Knaepen, Werner and Smeets, D and Schrauwen, A and Comrie, CM and Barradas, NP and Vieira, A and Detavernier, Christophe and Temst, K and Vantomme, A},
  issn         = {0021-8979},
  journal      = {JOURNAL OF APPLIED PHYSICS},
  keyword      = {THIN-FILMS,INTERMETALLIC COMPOUNDS,RUTHERFORD BACKSCATTERING DATA,DIFFUSION MECHANISMS,THERMAL-EXPANSION,SCHOTTKY-BARRIER,NICKEL SILICIDE,ERBIUM,MARKER,METALS},
  language     = {eng},
  number       = {4},
  pages        = {13},
  title        = {In situ study of the growth properties of Ni-rare earth silicides for interlayer and alloy systems on Si(100)},
  url          = {http://dx.doi.org/10.1063/1.3681331},
  volume       = {111},
  year         = {2012},
}

Chicago
Demeulemeester, J, Werner Knaepen, D Smeets, A Schrauwen, CM Comrie, NP Barradas, A Vieira, Christophe Detavernier, K Temst, and A Vantomme. 2012. “In Situ Study of the Growth Properties of Ni-rare Earth Silicides for Interlayer and Alloy Systems on Si(100).” Journal of Applied Physics 111 (4).
APA
Demeulemeester, J, Knaepen, W., Smeets, D., Schrauwen, A., Comrie, C., Barradas, N., Vieira, A., et al. (2012). In situ study of the growth properties of Ni-rare earth silicides for interlayer and alloy systems on Si(100). JOURNAL OF APPLIED PHYSICS, 111(4).
Vancouver
1.
Demeulemeester J, Knaepen W, Smeets D, Schrauwen A, Comrie C, Barradas N, et al. In situ study of the growth properties of Ni-rare earth silicides for interlayer and alloy systems on Si(100). JOURNAL OF APPLIED PHYSICS. 2012;111(4).
MLA
Demeulemeester, J, Werner Knaepen, D Smeets, et al. “In Situ Study of the Growth Properties of Ni-rare Earth Silicides for Interlayer and Alloy Systems on Si(100).” JOURNAL OF APPLIED PHYSICS 111.4 (2012): n. pag. Print.