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In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry

Jolien Dendooven UGent, Kilian Devloo-Casier UGent, Elisabeth Levrau UGent, Robbert Van Hove UGent, Sreeprasanth Pulinthanathu Sree, Mikhail R Baklanov, Johan A Martens and Christophe Detavernier UGent (2012) LANGMUIR. 28(8). p.3852-3859
abstract
Ellipsometric porosimetry (EP) is a handy technique to characterize the porosity and pore size distribution of porous thin films with pore diameters in the range from below 1 nm up to 50 nm and for the characterization of porous low-k films especially. Atomic layer deposition (ALD) can be used to functionalize porous films and membranes, e.g., for the development of filtration and sensor devices and catalytic surfaces. In this work we report on the implementation of the EP technique onto an ALD reactor. This combination allowed us to employ EP for monitoring the modification of a porous thin film through ALD without removing the sample from the deposition setup. The potential of in situ EP for providing information about the effect of ALD coating on the accessible porosity, the pore radius distribution, the thickness, and mechanical properties of a porous film is demonstrated in the ALD of TiO2 in a mesoporous silica film.
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
POROUS SILICON, SURFACE-AREA, MESOPOROUS SILICA, LOW-K FILMS, PORE-SIZE DISTRIBUTION, TIO2, GROWTH, MEMBRANES, ADSORPTION, FILTRATION
journal title
LANGMUIR
Langmuir
volume
28
issue
8
pages
3852 - 3859
Web of Science type
Article
Web of Science id
000300757700023
JCR category
MATERIALS SCIENCE, MULTIDISCIPLINARY
JCR impact factor
4.187 (2012)
JCR rank
30/239 (2012)
JCR quartile
1 (2012)
ISSN
0743-7463
DOI
10.1021/la300045z
language
English
UGent publication?
yes
classification
A1
copyright statement
I don't know the status of the copyright for this publication
id
2154260
handle
http://hdl.handle.net/1854/LU-2154260
date created
2012-06-14 17:25:15
date last changed
2012-07-02 10:26:40
@article{2154260,
  abstract     = {Ellipsometric porosimetry (EP) is a handy technique to characterize the porosity and pore size distribution of porous thin films with pore diameters in the range from below 1 nm up to 50 nm and for the characterization of porous low-k films especially. Atomic layer deposition (ALD) can be used to functionalize porous films and membranes, e.g., for the development of filtration and sensor devices and catalytic surfaces. In this work we report on the implementation of the EP technique onto an ALD reactor. This combination allowed us to employ EP for monitoring the modification of a porous thin film through ALD without removing the sample from the deposition setup. The potential of in situ EP for providing information about the effect of ALD coating on the accessible porosity, the pore radius distribution, the thickness, and mechanical properties of a porous film is demonstrated in the ALD of TiO2 in a mesoporous silica film.},
  author       = {Dendooven, Jolien and Devloo-Casier, Kilian and Levrau, Elisabeth and Van Hove, Robbert and Sree, Sreeprasanth Pulinthanathu and Baklanov, Mikhail R and Martens, Johan A and Detavernier, Christophe},
  issn         = {0743-7463},
  journal      = {LANGMUIR},
  keyword      = {POROUS SILICON,SURFACE-AREA,MESOPOROUS SILICA,LOW-K FILMS,PORE-SIZE DISTRIBUTION,TIO2,GROWTH,MEMBRANES,ADSORPTION,FILTRATION},
  language     = {eng},
  number       = {8},
  pages        = {3852--3859},
  title        = {In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry},
  url          = {http://dx.doi.org/10.1021/la300045z},
  volume       = {28},
  year         = {2012},
}

Chicago
Dendooven, Jolien, Kilian Devloo-Casier, Elisabeth Levrau, Robbert Van Hove, Sreeprasanth Pulinthanathu Sree, Mikhail R Baklanov, Johan A Martens, and Christophe Detavernier. 2012. “In Situ Monitoring of Atomic Layer Deposition in Nanoporous Thin Films Using Ellipsometric Porosimetry.” Langmuir 28 (8): 3852–3859.
APA
Dendooven, J., Devloo-Casier, K., Levrau, E., Van Hove, R., Sree, S. P., Baklanov, M. R., Martens, J. A., et al. (2012). In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry. LANGMUIR, 28(8), 3852–3859.
Vancouver
1.
Dendooven J, Devloo-Casier K, Levrau E, Van Hove R, Sree SP, Baklanov MR, et al. In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry. LANGMUIR. 2012;28(8):3852–9.
MLA
Dendooven, Jolien, Kilian Devloo-Casier, Elisabeth Levrau, et al. “In Situ Monitoring of Atomic Layer Deposition in Nanoporous Thin Films Using Ellipsometric Porosimetry.” LANGMUIR 28.8 (2012): 3852–3859. Print.