Advanced search
1 file | 3.55 MB

In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry

(2012) LANGMUIR. 28(8). p.3852-3859
Author
Organization
Abstract
Ellipsometric porosimetry (EP) is a handy technique to characterize the porosity and pore size distribution of porous thin films with pore diameters in the range from below 1 nm up to 50 nm and for the characterization of porous low-k films especially. Atomic layer deposition (ALD) can be used to functionalize porous films and membranes, e.g., for the development of filtration and sensor devices and catalytic surfaces. In this work we report on the implementation of the EP technique onto an ALD reactor. This combination allowed us to employ EP for monitoring the modification of a porous thin film through ALD without removing the sample from the deposition setup. The potential of in situ EP for providing information about the effect of ALD coating on the accessible porosity, the pore radius distribution, the thickness, and mechanical properties of a porous film is demonstrated in the ALD of TiO2 in a mesoporous silica film.
Keywords
POROUS SILICON, SURFACE-AREA, MESOPOROUS SILICA, LOW-K FILMS, PORE-SIZE DISTRIBUTION, TIO2, GROWTH, MEMBRANES, ADSORPTION, FILTRATION

Downloads

  • (...).pdf
    • full text
    • |
    • UGent only
    • |
    • PDF
    • |
    • 3.55 MB

Citation

Please use this url to cite or link to this publication:

Chicago
Dendooven, Jolien, Kilian Devloo-Casier, Elisabeth Levrau, Robbert Van Hove, Sreeprasanth Pulinthanathu Sree, Mikhail R Baklanov, Johan A Martens, and Christophe Detavernier. 2012. “In Situ Monitoring of Atomic Layer Deposition in Nanoporous Thin Films Using Ellipsometric Porosimetry.” Langmuir 28 (8): 3852–3859.
APA
Dendooven, J., Devloo-Casier, K., Levrau, E., Van Hove, R., Sree, S. P., Baklanov, M. R., Martens, J. A., et al. (2012). In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry. LANGMUIR, 28(8), 3852–3859.
Vancouver
1.
Dendooven J, Devloo-Casier K, Levrau E, Van Hove R, Sree SP, Baklanov MR, et al. In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry. LANGMUIR. 2012;28(8):3852–9.
MLA
Dendooven, Jolien, Kilian Devloo-Casier, Elisabeth Levrau, et al. “In Situ Monitoring of Atomic Layer Deposition in Nanoporous Thin Films Using Ellipsometric Porosimetry.” LANGMUIR 28.8 (2012): 3852–3859. Print.
@article{2154260,
  abstract     = {Ellipsometric porosimetry (EP) is a handy technique to characterize the porosity and pore size distribution of porous thin films with pore diameters in the range from below 1 nm up to 50 nm and for the characterization of porous low-k films especially. Atomic layer deposition (ALD) can be used to functionalize porous films and membranes, e.g., for the development of filtration and sensor devices and catalytic surfaces. In this work we report on the implementation of the EP technique onto an ALD reactor. This combination allowed us to employ EP for monitoring the modification of a porous thin film through ALD without removing the sample from the deposition setup. The potential of in situ EP for providing information about the effect of ALD coating on the accessible porosity, the pore radius distribution, the thickness, and mechanical properties of a porous film is demonstrated in the ALD of TiO2 in a mesoporous silica film.},
  author       = {Dendooven, Jolien and Devloo-Casier, Kilian and Levrau, Elisabeth and Van Hove, Robbert and Sree, Sreeprasanth Pulinthanathu and Baklanov, Mikhail R and Martens, Johan A and Detavernier, Christophe},
  issn         = {0743-7463},
  journal      = {LANGMUIR},
  keyword      = {POROUS SILICON,SURFACE-AREA,MESOPOROUS SILICA,LOW-K FILMS,PORE-SIZE DISTRIBUTION,TIO2,GROWTH,MEMBRANES,ADSORPTION,FILTRATION},
  language     = {eng},
  number       = {8},
  pages        = {3852--3859},
  title        = {In situ monitoring of atomic layer deposition in nanoporous thin films using ellipsometric porosimetry},
  url          = {http://dx.doi.org/10.1021/la300045z},
  volume       = {28},
  year         = {2012},
}

Altmetric
View in Altmetric
Web of Science
Times cited: