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Modeling reactive magnetron sputtering: fixing the parameter set

Koen Strijckmans (UGent) , Wouter Leroy (UGent) , Roger De Gryse (UGent) and Diederik Depla (UGent)
(2012) SURFACE & COATINGS TECHNOLOGY. 206(17). p.3666-3675
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Keywords
DEPOSITION, SIMULATION, COEFFICIENT, ION ENERGY, DISCHARGE VOLTAGE, ATOMIC OXYGEN, Yttrium, Modeling, Aluminum, Reactive sputtering, OXIDATION, STICKING, O-2

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Citation

Please use this url to cite or link to this publication:

Chicago
Strijckmans, Koen, Wouter Leroy, Roger De Gryse, and Diederik Depla. 2012. “Modeling Reactive Magnetron Sputtering: Fixing the Parameter Set.” Surface & Coatings Technology 206 (17): 3666–3675.
APA
Strijckmans, Koen, Leroy, W., De Gryse, R., & Depla, D. (2012). Modeling reactive magnetron sputtering: fixing the parameter set. SURFACE & COATINGS TECHNOLOGY, 206(17), 3666–3675.
Vancouver
1.
Strijckmans K, Leroy W, De Gryse R, Depla D. Modeling reactive magnetron sputtering: fixing the parameter set. SURFACE & COATINGS TECHNOLOGY. 2012;206(17):3666–75.
MLA
Strijckmans, Koen, Wouter Leroy, Roger De Gryse, et al. “Modeling Reactive Magnetron Sputtering: Fixing the Parameter Set.” SURFACE & COATINGS TECHNOLOGY 206.17 (2012): 3666–3675. Print.
@article{2112621,
  author       = {Strijckmans, Koen and Leroy, Wouter and De Gryse, Roger and Depla, Diederik},
  issn         = {0257-8972},
  journal      = {SURFACE \& COATINGS TECHNOLOGY},
  keyword      = {DEPOSITION,SIMULATION,COEFFICIENT,ION ENERGY,DISCHARGE VOLTAGE,ATOMIC OXYGEN,Yttrium,Modeling,Aluminum,Reactive sputtering,OXIDATION,STICKING,O-2},
  language     = {eng},
  number       = {17},
  pages        = {3666--3675},
  title        = {Modeling reactive magnetron sputtering: fixing the parameter set},
  url          = {http://dx.doi.org/10.1016/j.surfcoat.2012.03.019},
  volume       = {206},
  year         = {2012},
}

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