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Deposition of thin films by sputtering cold isostatically pressed powder targets: a case study

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Keywords
sputter yield, target roughness, powder targets, magnetron sputtering, SECONDARY ELECTRONS, OXIDE-FILMS, MAGNETRON DISCHARGE, COMPACTED TARGET, COATINGS, MULTICOMPONENT, TEMPERATURE, DEPENDENCE, YIELD, TIN

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Citation

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MLA
Boydens, Francis, Wouter Leroy, Rosita Persoons, et al. “Deposition of Thin Films by Sputtering Cold Isostatically Pressed Powder Targets: a Case Study.” PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE 209.3 (2012): 524–530. Print.
APA
Boydens, F., Leroy, W., Persoons, R., & Depla, D. (2012). Deposition of thin films by sputtering cold isostatically pressed powder targets: a case study. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 209(3), 524–530.
Chicago author-date
Boydens, Francis, Wouter Leroy, Rosita Persoons, and Diederik Depla. 2012. “Deposition of Thin Films by Sputtering Cold Isostatically Pressed Powder Targets: a Case Study.” Physica Status Solidi A-applications and Materials Science 209 (3): 524–530.
Chicago author-date (all authors)
Boydens, Francis, Wouter Leroy, Rosita Persoons, and Diederik Depla. 2012. “Deposition of Thin Films by Sputtering Cold Isostatically Pressed Powder Targets: a Case Study.” Physica Status Solidi A-applications and Materials Science 209 (3): 524–530.
Vancouver
1.
Boydens F, Leroy W, Persoons R, Depla D. Deposition of thin films by sputtering cold isostatically pressed powder targets: a case study. PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE. 2012;209(3):524–30.
IEEE
[1]
F. Boydens, W. Leroy, R. Persoons, and D. Depla, “Deposition of thin films by sputtering cold isostatically pressed powder targets: a case study,” PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, vol. 209, no. 3, pp. 524–530, 2012.
@article{2109149,
  author       = {Boydens, Francis and Leroy, Wouter and Persoons, Rosita and Depla, Diederik},
  issn         = {1862-6300},
  journal      = {PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE},
  keywords     = {sputter yield,target roughness,powder targets,magnetron sputtering,SECONDARY ELECTRONS,OXIDE-FILMS,MAGNETRON DISCHARGE,COMPACTED TARGET,COATINGS,MULTICOMPONENT,TEMPERATURE,DEPENDENCE,YIELD,TIN},
  language     = {eng},
  number       = {3},
  pages        = {524--530},
  title        = {Deposition of thin films by sputtering cold isostatically pressed powder targets: a case study},
  url          = {http://dx.doi.org/10.1002/pssa.201127490},
  volume       = {209},
  year         = {2012},
}

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