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Sputter deposition of MgO thin films: the effect of cation substitution

Marta Martins Saraiva UGent (2012)
abstract
The importance of thin films relies on their ability to modify in an easy and, in most cases, cost efficient way the surface properties of bulk materials and thus, their functionality. Thin films have been deposited already for a long time. Sputter deposition is a widely used technique since it combines versatility, control over the composition and microstructure, relatively high deposition rates and conceptual simplicity. Most of the new technologically interesting materials have complex chemistry and crystalline structure. An example of the increased complexity is the ternary metal oxides of the group Mg-M-O, where M represents a metal other than Mg. This class of materials has gained considerable research attention the last years and Mg-M-O films find application in catalysis and surface protection, as well as in high-k dielectrics, ionic conductors, high Tc superconductors, and thin film batteries. The goal of the present thesis is to contribute towards understanding the fundamental growth mechanisms of sputter deposited ternary oxide films with the general formula Mg-M-O (where M is a metal different than Mg). The key objectives of the study are: (i) To establish the relation between the deposition conditions and the chemical composition in the Mg-M-O films and through this, achieve an efficient and accurate control over the film stoichiometry. (ii) To understand the effect of the deposition conditions and the chemical composition on the structure formation and crystallographic properties of Mg-M-O films. (ii) To elucidate the effect of chemistry and microstructure on a number of functional properties of the Mg-M-O films. Films are deposited employing reactive magnetron sputtering (in an Ar-O2 atmosphere) from two (Mg and M) confocally arranged magnetron sources. This multisource approach facilitates a large flexibility with respect to the chemical compositions that can be accessed. In addition, the confocal arrangement of the sources leads to an off-normal deposition flux providing a tool to control and tune the crystallographic properties of the films. The metals (M) Al, Cr, Ti, Y and Zr are chosen to systematically vary key physical parameters of the substituting element in the metal sublattice of the Mg-M-O films, i.e. the valence electron number and the atomic size, and to study their largely unexplored effect on the film microstructure and crystallographic properties.
Please use this url to cite or link to this publication:
author
promoter
UGent
organization
year
type
dissertation (monograph)
subject
pages
III, 144 pages
publisher
Ghent University. Faculty of Sciences
place of publication
Ghent, Belgium
defense location
Gent : Campus Sterre (S1, auditorium 1)
defense date
2012-04-06 15:00
ISBN
9789461970381
language
English
UGent publication?
yes
classification
D1
copyright statement
I have retained and own the full copyright for this publication
id
2100270
handle
http://hdl.handle.net/1854/LU-2100270
date created
2012-05-07 15:23:44
date last changed
2012-05-08 09:11:43
@phdthesis{2100270,
  abstract     = {The importance of thin films relies on their ability to modify in an easy and, in most cases, cost efficient way the surface properties of bulk materials and thus, their functionality. Thin films have been deposited already for a long time. Sputter deposition is a widely used technique since it combines versatility, control over the composition and microstructure, relatively high deposition rates and conceptual simplicity.
Most of the new technologically interesting materials have complex chemistry and crystalline structure. An example of the increased complexity is the ternary metal oxides of the group Mg-M-O, where M represents a metal other than Mg. This class of materials has gained considerable research attention the last years and Mg-M-O films find application in catalysis and surface protection, as well as in high-k dielectrics, ionic conductors, high Tc superconductors, and thin film batteries.
The goal of the present thesis is to contribute towards understanding the fundamental growth mechanisms of sputter deposited ternary oxide films with the general formula Mg-M-O (where M is a metal different than Mg). The key objectives of the study are:
(i) To establish the relation between the deposition conditions and the chemical composition in the Mg-M-O films and through this, achieve an efficient and accurate control over the film stoichiometry.
(ii) To understand the effect of the deposition conditions and the chemical composition on the structure formation and crystallographic properties of Mg-M-O films.
(ii) To elucidate the effect of chemistry and microstructure on a number of functional properties of the Mg-M-O films.
Films are deposited employing reactive magnetron sputtering (in an Ar-O2 atmosphere) from two (Mg and M) confocally arranged magnetron sources. This multisource approach facilitates a large flexibility with respect to the chemical compositions that can be accessed. In addition, the confocal arrangement of the sources leads to an off-normal deposition flux providing a tool to control and tune the crystallographic properties of the films. The metals (M) Al, Cr, Ti, Y and Zr are chosen to systematically vary key physical parameters of the substituting element in the metal sublattice of the Mg-M-O films, i.e. the valence electron number and the atomic size, and to study their largely unexplored effect on the film microstructure and crystallographic properties.},
  author       = {Martins Saraiva, Marta},
  isbn         = {9789461970381},
  language     = {eng},
  pages        = {III, 144},
  publisher    = {Ghent University. Faculty of Sciences},
  school       = {Ghent University},
  title        = {Sputter deposition of MgO thin films: the effect of cation substitution},
  year         = {2012},
}

Chicago
Martins Saraiva, Marta. 2012. “Sputter Deposition of MgO Thin Films: The Effect of Cation Substitution”. Ghent, Belgium: Ghent University. Faculty of Sciences.
APA
Martins Saraiva, M. (2012). Sputter deposition of MgO thin films: the effect of cation substitution. Ghent University. Faculty of Sciences, Ghent, Belgium.
Vancouver
1.
Martins Saraiva M. Sputter deposition of MgO thin films: the effect of cation substitution. [Ghent, Belgium]: Ghent University. Faculty of Sciences; 2012.
MLA
Martins Saraiva, Marta. “Sputter Deposition of MgO Thin Films: The Effect of Cation Substitution.” 2012 : n. pag. Print.