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Ultra low-k cyclic carbon-bridged PMO films with a high chemical resistance

(2012) JOURNAL OF MATERIALS CHEMISTRY. 22(17). p.8281-8286
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Citation

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Chicago
Goethals, Frederik, Ivan Ciofi, Oreste Madia, Kris Vanstreels, Mikhail R Baklanov, Christophe Detavernier, Pascal Van Der Voort, and Isabel Van Driessche. 2012. “Ultra Low-k Cyclic Carbon-bridged PMO Films with a High Chemical Resistance.” Journal of Materials Chemistry 22 (17): 8281–8286.
APA
Goethals, Frederik, Ciofi, I., Madia, O., Vanstreels, K., Baklanov, M. R., Detavernier, C., Van Der Voort, P., et al. (2012). Ultra low-k cyclic carbon-bridged PMO films with a high chemical resistance. JOURNAL OF MATERIALS CHEMISTRY, 22(17), 8281–8286.
Vancouver
1.
Goethals F, Ciofi I, Madia O, Vanstreels K, Baklanov MR, Detavernier C, et al. Ultra low-k cyclic carbon-bridged PMO films with a high chemical resistance. JOURNAL OF MATERIALS CHEMISTRY. 2012;22(17):8281–6.
MLA
Goethals, Frederik, Ivan Ciofi, Oreste Madia, et al. “Ultra Low-k Cyclic Carbon-bridged PMO Films with a High Chemical Resistance.” JOURNAL OF MATERIALS CHEMISTRY 22.17 (2012): 8281–8286. Print.
@article{2091527,
  author       = {Goethals, Frederik and Ciofi, Ivan and Madia, Oreste and Vanstreels, Kris and Baklanov, Mikhail R and Detavernier, Christophe and Van Der Voort, Pascal and Van Driessche, Isabel},
  issn         = {0959-9428},
  journal      = {JOURNAL OF MATERIALS CHEMISTRY},
  language     = {eng},
  number       = {17},
  pages        = {8281--8286},
  title        = {Ultra low-k cyclic carbon-bridged PMO films with a high chemical resistance},
  url          = {http://dx.doi.org/10.1039/C2JM30312D},
  volume       = {22},
  year         = {2012},
}

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