Recapture of secondary electrons by the target in a DC planar magnetron discharge
- Author
- Guy Buyle, W De Bosscher, D Dopla, Karin Eufinger (UGent) , Johan Haemers (UGent) and Roger De Gryse (UGent)
- Organization
- Keywords
- magnetron sputtering, discharge, secondary electrons, secondary electron yield, CELL/MONTE CARLO METHOD, METAL-SURFACE, REFLECTION, SIMULATION, EMISSION
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Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-208682
- MLA
- Buyle, Guy, et al. “Recapture of Secondary Electrons by the Target in a DC Planar Magnetron Discharge.” VACUUM, vol. 70, no. 1, 2003, pp. 29–35, doi:10.1016/S0042-207X(02)00664-4.
- APA
- Buyle, G., De Bosscher, W., Dopla, D., Eufinger, K., Haemers, J., & De Gryse, R. (2003). Recapture of secondary electrons by the target in a DC planar magnetron discharge. VACUUM, 70(1), 29–35. https://doi.org/10.1016/S0042-207X(02)00664-4
- Chicago author-date
- Buyle, Guy, W De Bosscher, D Dopla, Karin Eufinger, Johan Haemers, and Roger De Gryse. 2003. “Recapture of Secondary Electrons by the Target in a DC Planar Magnetron Discharge.” VACUUM 70 (1): 29–35. https://doi.org/10.1016/S0042-207X(02)00664-4.
- Chicago author-date (all authors)
- Buyle, Guy, W De Bosscher, D Dopla, Karin Eufinger, Johan Haemers, and Roger De Gryse. 2003. “Recapture of Secondary Electrons by the Target in a DC Planar Magnetron Discharge.” VACUUM 70 (1): 29–35. doi:10.1016/S0042-207X(02)00664-4.
- Vancouver
- 1.Buyle G, De Bosscher W, Dopla D, Eufinger K, Haemers J, De Gryse R. Recapture of secondary electrons by the target in a DC planar magnetron discharge. VACUUM. 2003;70(1):29–35.
- IEEE
- [1]G. Buyle, W. De Bosscher, D. Dopla, K. Eufinger, J. Haemers, and R. De Gryse, “Recapture of secondary electrons by the target in a DC planar magnetron discharge,” VACUUM, vol. 70, no. 1, pp. 29–35, 2003.
@article{208682,
author = {{Buyle, Guy and De Bosscher, W and Dopla, D and Eufinger, Karin and Haemers, Johan and De Gryse, Roger}},
issn = {{0042-207X}},
journal = {{VACUUM}},
keywords = {{magnetron sputtering,discharge,secondary electrons,secondary electron yield,CELL/MONTE CARLO METHOD,METAL-SURFACE,REFLECTION,SIMULATION,EMISSION}},
language = {{eng}},
number = {{1}},
pages = {{29--35}},
title = {{Recapture of secondary electrons by the target in a DC planar magnetron discharge}},
url = {{http://doi.org/10.1016/S0042-207X(02)00664-4}},
volume = {{70}},
year = {{2003}},
}
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