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A study of the electrical and interfacial properties of sputtered Ti/Si and sputtered TiSi₂/Si Schottky barriers

(1988) SOLID-STATE ELECTRONICS. 31(5). p.945-951
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Chicago
De Bosscher, W, Roland Vanmeirhaeghe, A De Laere, Willy Laflere, and Felix Cardon. 1988. “A Study of the Electrical and Interfacial Properties of Sputtered Ti/Si and Sputtered TiSi₂/Si Schottky Barriers.” Solid-state Electronics 31 (5): 945–951.
APA
De Bosscher, W, Vanmeirhaeghe, R., De Laere, A., Laflere, W., & Cardon, F. (1988). A study of the electrical and interfacial properties of sputtered Ti/Si and sputtered TiSi₂/Si Schottky barriers. SOLID-STATE ELECTRONICS, 31(5), 945–951.
Vancouver
1.
De Bosscher W, Vanmeirhaeghe R, De Laere A, Laflere W, Cardon F. A study of the electrical and interfacial properties of sputtered Ti/Si and sputtered TiSi₂/Si Schottky barriers. SOLID-STATE ELECTRONICS. 1988;31(5):945–51.
MLA
De Bosscher, W, Roland Vanmeirhaeghe, A De Laere, et al. “A Study of the Electrical and Interfacial Properties of Sputtered Ti/Si and Sputtered TiSi₂/Si Schottky Barriers.” SOLID-STATE ELECTRONICS 31.5 (1988): 945–951. Print.
@article{2085699,
  author       = {De Bosscher, W and Vanmeirhaeghe, Roland and De Laere, A and Laflere, Willy and Cardon, Felix},
  issn         = {0038-1101},
  journal      = {SOLID-STATE ELECTRONICS},
  language     = {eng},
  number       = {5},
  pages        = {945--951},
  title        = {A study of the electrical and interfacial properties of sputtered Ti/Si and sputtered TiSi\unmatched{2082}/Si Schottky barriers},
  url          = {http://dx.doi.org/10.1016/0038-1101(88)90049-4},
  volume       = {31},
  year         = {1988},
}

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