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Implantation of the sputtering gas as a factor in the target voltage behaviour during reactive sputtering

Roger De Gryse (UGent), Diederik Depla (UGent) and Johan Haemers (UGent)
(2003) BELVAC NEWS. 19(3). p.5-12
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Chicago
De Gryse, Roger, Diederik Depla, and Johan Haemers. 2003. “Implantation of the Sputtering Gas as a Factor in the Target Voltage Behaviour During Reactive Sputtering.” Belvac News 19 (3): 5–12.
APA
De Gryse, R., Depla, D., & Haemers, J. (2003). Implantation of the sputtering gas as a factor in the target voltage behaviour during reactive sputtering. BELVAC NEWS, 19(3), 5–12.
Vancouver
1.
De Gryse R, Depla D, Haemers J. Implantation of the sputtering gas as a factor in the target voltage behaviour during reactive sputtering. BELVAC NEWS. 2003;19(3):5–12.
MLA
De Gryse, Roger, Diederik Depla, and Johan Haemers. “Implantation of the Sputtering Gas as a Factor in the Target Voltage Behaviour During Reactive Sputtering.” BELVAC NEWS 19.3 (2003): 5–12. Print.
@article{208413,
  author       = {De Gryse, Roger and Depla, Diederik and Haemers, Johan},
  issn         = {0773-8838},
  journal      = {BELVAC NEWS},
  language     = {eng},
  number       = {3},
  pages        = {5--12},
  title        = {Implantation of the sputtering gas as a factor in the target voltage behaviour during reactive sputtering},
  volume       = {19},
  year         = {2003},
}