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Target voltage measurements during DC sputtering of silver in a nitrogen/argon plasma

Diederik Depla (UGent) and Roger De Gryse (UGent)
(2003) VACUUM. 69(4). p.529-536
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Keywords
ion implantation effects, magnetron sputtering, target voltage change, ION MASS-SPECTROMETRY, SPECTROSCOPY, IMPLANTATION, DISCHARGES

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Chicago
Depla, Diederik, and Roger De Gryse. 2003. “Target Voltage Measurements During DC Sputtering of Silver in a Nitrogen/argon Plasma.” Vacuum 69 (4): 529–536.
APA
Depla, D., & De Gryse, R. (2003). Target voltage measurements during DC sputtering of silver in a nitrogen/argon plasma. VACUUM, 69(4), 529–536.
Vancouver
1.
Depla D, De Gryse R. Target voltage measurements during DC sputtering of silver in a nitrogen/argon plasma. VACUUM. 2003;69(4):529–36.
MLA
Depla, Diederik, and Roger De Gryse. “Target Voltage Measurements During DC Sputtering of Silver in a Nitrogen/argon Plasma.” VACUUM 69.4 (2003): 529–536. Print.
@article{208406,
  author       = {Depla, Diederik and De Gryse, Roger},
  issn         = {0042-207X},
  journal      = {VACUUM},
  keyword      = {ion implantation effects,magnetron sputtering,target voltage change,ION MASS-SPECTROMETRY,SPECTROSCOPY,IMPLANTATION,DISCHARGES},
  language     = {eng},
  number       = {4},
  pages        = {529--536},
  title        = {Target voltage measurements during DC sputtering of silver in a nitrogen/argon plasma},
  url          = {http://dx.doi.org/10.1016/S0042-207X(02)00602-4},
  volume       = {69},
  year         = {2003},
}

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