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Influence of deposition rate on electrical-properties of thin-tellurium films

Alexis De Vos (UGent) and J Aaerts
(1977) THIN SOLID FILMS. 46(2). p.223-228
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Chicago
De Vos, Alexis, and J Aaerts. 1977. “Influence of Deposition Rate on Electrical-properties of Thin-tellurium Films.” Thin Solid Films 46 (2): 223–228.
APA
De Vos, Alexis, & Aaerts, J. (1977). Influence of deposition rate on electrical-properties of thin-tellurium films. THIN SOLID FILMS, 46(2), 223–228.
Vancouver
1.
De Vos A, Aaerts J. Influence of deposition rate on electrical-properties of thin-tellurium films. THIN SOLID FILMS. 1977;46(2):223–8.
MLA
De Vos, Alexis, and J Aaerts. “Influence of Deposition Rate on Electrical-properties of Thin-tellurium Films.” THIN SOLID FILMS 46.2 (1977): 223–228. Print.
@article{207751,
  author       = {De Vos, Alexis and Aaerts, J},
  issn         = {0040-6090},
  journal      = {THIN SOLID FILMS},
  language     = {eng},
  number       = {2},
  pages        = {223--228},
  title        = {Influence of deposition rate on electrical-properties of thin-tellurium films},
  url          = {http://dx.doi.org/10.1016/0040-6090(77)90066-9},
  volume       = {46},
  year         = {1977},
}

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