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TUNNEL OXIDES GROWN BY RAPID THERMAL-OXIDATION.

Michel Depas, Roland Vanmeirhaeghe, Willy Laflere and Felix Cardon (1993) MICROELECTRONIC ENGINEERING. 22(1-4). p.61-64
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
journal title
MICROELECTRONIC ENGINEERING
Microelectron. Eng.
volume
22
issue
1-4
pages
61-64 pages
Web of Science type
Article
ISSN
0167-9317
language
English
UGent publication?
yes
classification
A1
id
202928
handle
http://hdl.handle.net/1854/LU-202928
date created
2004-01-14 13:42:00
date last changed
2016-12-19 15:38:29
@article{202928,
  author       = {Depas, Michel and Vanmeirhaeghe, Roland and Laflere, Willy and Cardon, Felix},
  issn         = {0167-9317},
  journal      = {MICROELECTRONIC ENGINEERING},
  language     = {eng},
  number       = {1-4},
  pages        = {61--64},
  title        = {TUNNEL OXIDES GROWN BY RAPID THERMAL-OXIDATION.},
  volume       = {22},
  year         = {1993},
}

Chicago
Depas, Michel, Roland Vanmeirhaeghe, Willy Laflere, and Felix Cardon. 1993. “Tunnel Oxides Grown by Rapid Thermal-oxidation.” Microelectronic Engineering 22 (1-4): 61–64.
APA
Depas, M., Vanmeirhaeghe, R., Laflere, W., & Cardon, F. (1993). TUNNEL OXIDES GROWN BY RAPID THERMAL-OXIDATION. MICROELECTRONIC ENGINEERING, 22(1-4), 61–64.
Vancouver
1.
Depas M, Vanmeirhaeghe R, Laflere W, Cardon F. TUNNEL OXIDES GROWN BY RAPID THERMAL-OXIDATION. MICROELECTRONIC ENGINEERING. 1993;22(1-4):61–4.
MLA
Depas, Michel, Roland Vanmeirhaeghe, Willy Laflere, et al. “Tunnel Oxides Grown by Rapid Thermal-oxidation.” MICROELECTRONIC ENGINEERING 22.1-4 (1993): 61–64. Print.