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A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers

Frederik Goethals UGent, Mikhail R Baklanov, Ivan Ciofi, Christophe Detavernier UGent, Pascal Van Der Voort UGent and Isabel Van Driessche UGent (2012) CHEMICAL COMMUNICATIONS. 48(22). p.2797-2799
abstract
A new strategy to seal mesoporous low-k thin films with a pore size of 3 nm has been developed. This is achieved by spin-coating of a self-assembled carbon-bridged organosilica layer followed by a grafting with hexamethyl disilazane.
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
SILICA, DIELECTRIC-CONSTANT MATERIALS, HYBRID, LAYER
journal title
CHEMICAL COMMUNICATIONS
Chem. Commun.
volume
48
issue
22
pages
2797 - 2799
Web of Science type
Article
Web of Science id
000300312600018
JCR category
CHEMISTRY, MULTIDISCIPLINARY
JCR impact factor
6.378 (2012)
JCR rank
19/150 (2012)
JCR quartile
1 (2012)
ISSN
1359-7345
DOI
10.1039/c2cc18017k
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
2010227
handle
http://hdl.handle.net/1854/LU-2010227
date created
2012-01-31 17:01:28
date last changed
2012-05-22 11:19:44
@article{2010227,
  abstract     = {A new strategy to seal mesoporous low-k thin films with a pore size of 3 nm has been developed. This is achieved by spin-coating of a self-assembled carbon-bridged organosilica layer followed by a grafting with hexamethyl disilazane.},
  author       = {Goethals, Frederik and Baklanov, Mikhail R and Ciofi, Ivan and Detavernier, Christophe and Van Der Voort, Pascal and Van Driessche, Isabel},
  issn         = {1359-7345},
  journal      = {CHEMICAL COMMUNICATIONS},
  keyword      = {SILICA,DIELECTRIC-CONSTANT MATERIALS,HYBRID,LAYER},
  language     = {eng},
  number       = {22},
  pages        = {2797--2799},
  title        = {A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers},
  url          = {http://dx.doi.org/10.1039/c2cc18017k},
  volume       = {48},
  year         = {2012},
}

Chicago
Goethals, Frederik, Mikhail R Baklanov, Ivan Ciofi, Christophe Detavernier, Pascal Van Der Voort, and Isabel Van Driessche. 2012. “A New Procedure to Seal the Pores of Mesoporous Low-k Films with Precondensed Organosilica Oligomers.” Chemical Communications 48 (22): 2797–2799.
APA
Goethals, Frederik, Baklanov, M. R., Ciofi, I., Detavernier, C., Van Der Voort, P., & Van Driessche, I. (2012). A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers. CHEMICAL COMMUNICATIONS, 48(22), 2797–2799.
Vancouver
1.
Goethals F, Baklanov MR, Ciofi I, Detavernier C, Van Der Voort P, Van Driessche I. A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers. CHEMICAL COMMUNICATIONS. 2012;48(22):2797–9.
MLA
Goethals, Frederik, Mikhail R Baklanov, Ivan Ciofi, et al. “A New Procedure to Seal the Pores of Mesoporous Low-k Films with Precondensed Organosilica Oligomers.” CHEMICAL COMMUNICATIONS 48.22 (2012): 2797–2799. Print.