A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers
- Author
- Frederik Goethals (UGent) , Mikhail R Baklanov, Ivan Ciofi, Christophe Detavernier (UGent) , Pascal Van Der Voort (UGent) and Isabel Van Driessche (UGent)
- Organization
- Abstract
- A new strategy to seal mesoporous low-k thin films with a pore size of 3 nm has been developed. This is achieved by spin-coating of a self-assembled carbon-bridged organosilica layer followed by a grafting with hexamethyl disilazane.
- Keywords
- SILICA, DIELECTRIC-CONSTANT MATERIALS, HYBRID, LAYER
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Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-2010227
- MLA
- Goethals, Frederik, et al. “A New Procedure to Seal the Pores of Mesoporous Low-k Films with Precondensed Organosilica Oligomers.” CHEMICAL COMMUNICATIONS, vol. 48, no. 22, 2012, pp. 2797–99, doi:10.1039/c2cc18017k.
- APA
- Goethals, F., Baklanov, M. R., Ciofi, I., Detavernier, C., Van Der Voort, P., & Van Driessche, I. (2012). A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers. CHEMICAL COMMUNICATIONS, 48(22), 2797–2799. https://doi.org/10.1039/c2cc18017k
- Chicago author-date
- Goethals, Frederik, Mikhail R Baklanov, Ivan Ciofi, Christophe Detavernier, Pascal Van Der Voort, and Isabel Van Driessche. 2012. “A New Procedure to Seal the Pores of Mesoporous Low-k Films with Precondensed Organosilica Oligomers.” CHEMICAL COMMUNICATIONS 48 (22): 2797–99. https://doi.org/10.1039/c2cc18017k.
- Chicago author-date (all authors)
- Goethals, Frederik, Mikhail R Baklanov, Ivan Ciofi, Christophe Detavernier, Pascal Van Der Voort, and Isabel Van Driessche. 2012. “A New Procedure to Seal the Pores of Mesoporous Low-k Films with Precondensed Organosilica Oligomers.” CHEMICAL COMMUNICATIONS 48 (22): 2797–2799. doi:10.1039/c2cc18017k.
- Vancouver
- 1.Goethals F, Baklanov MR, Ciofi I, Detavernier C, Van Der Voort P, Van Driessche I. A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers. CHEMICAL COMMUNICATIONS. 2012;48(22):2797–9.
- IEEE
- [1]F. Goethals, M. R. Baklanov, I. Ciofi, C. Detavernier, P. Van Der Voort, and I. Van Driessche, “A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers,” CHEMICAL COMMUNICATIONS, vol. 48, no. 22, pp. 2797–2799, 2012.
@article{2010227,
abstract = {{A new strategy to seal mesoporous low-k thin films with a pore size of 3 nm has been developed. This is achieved by spin-coating of a self-assembled carbon-bridged organosilica layer followed by a grafting with hexamethyl disilazane.}},
author = {{Goethals, Frederik and Baklanov, Mikhail R and Ciofi, Ivan and Detavernier, Christophe and Van Der Voort, Pascal and Van Driessche, Isabel}},
issn = {{1359-7345}},
journal = {{CHEMICAL COMMUNICATIONS}},
keywords = {{SILICA,DIELECTRIC-CONSTANT MATERIALS,HYBRID,LAYER}},
language = {{eng}},
number = {{22}},
pages = {{2797--2799}},
title = {{A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers}},
url = {{http://dx.doi.org/10.1039/c2cc18017k}},
volume = {{48}},
year = {{2012}},
}
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