A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers
(2012) CHEMICAL COMMUNICATIONS. 48(22). p.2797-2799- abstract
- A new strategy to seal mesoporous low-k thin films with a pore size of 3 nm has been developed. This is achieved by spin-coating of a self-assembled carbon-bridged organosilica layer followed by a grafting with hexamethyl disilazane.
Please use this url to cite or link to this publication:
http://hdl.handle.net/1854/LU-2010227
- author
- Frederik Goethals, Mikhail R Baklanov, Ivan Ciofi, Christophe Detavernier UGent, Pascal Van Der Voort UGent and Isabel Van Driessche UGent
- organization
- year
- 2012
- type
- journalArticle (original)
- publication status
- published
- subject
- keyword
- SILICA, DIELECTRIC-CONSTANT MATERIALS, HYBRID, LAYER
- journal title
- CHEMICAL COMMUNICATIONS
- Chem. Commun.
- volume
- 48
- issue
- 22
- pages
- 2797 - 2799
- Web of Science type
- Article
- Web of Science id
- 000300312600018
- JCR category
- CHEMISTRY, MULTIDISCIPLINARY
- JCR impact factor
- 6.378 (2012)
- JCR rank
- 19/150 (2012)
- JCR quartile
- 1 (2012)
- ISSN
- 1359-7345
- DOI
- 10.1039/c2cc18017k
- language
- English
- UGent publication?
- yes
- classification
- A1
- copyright statement
- I have transferred the copyright for this publication to the publisher
- id
- 2010227
- handle
- http://hdl.handle.net/1854/LU-2010227
- date created
- 2012-01-31 17:01:28
- date last changed
- 2016-12-19 15:39:40
@article{2010227,
abstract = {A new strategy to seal mesoporous low-k thin films with a pore size of 3 nm has been developed. This is achieved by spin-coating of a self-assembled carbon-bridged organosilica layer followed by a grafting with hexamethyl disilazane.},
author = {Goethals, Frederik and Baklanov, Mikhail R and Ciofi, Ivan and Detavernier, Christophe and Van Der Voort, Pascal and Van Driessche, Isabel},
issn = {1359-7345},
journal = {CHEMICAL COMMUNICATIONS},
keyword = {SILICA,DIELECTRIC-CONSTANT MATERIALS,HYBRID,LAYER},
language = {eng},
number = {22},
pages = {2797--2799},
title = {A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers},
url = {http://dx.doi.org/10.1039/c2cc18017k},
volume = {48},
year = {2012},
}
- Chicago
- Goethals, Frederik, Mikhail R Baklanov, Ivan Ciofi, Christophe Detavernier, Pascal Van Der Voort, and Isabel Van Driessche. 2012. “A New Procedure to Seal the Pores of Mesoporous Low-k Films with Precondensed Organosilica Oligomers.” Chemical Communications 48 (22): 2797–2799.
- APA
- Goethals, Frederik, Baklanov, M. R., Ciofi, I., Detavernier, C., Van Der Voort, P., & Van Driessche, I. (2012). A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers. CHEMICAL COMMUNICATIONS, 48(22), 2797–2799.
- Vancouver
- 1.Goethals F, Baklanov MR, Ciofi I, Detavernier C, Van Der Voort P, Van Driessche I. A new procedure to seal the pores of mesoporous low-k films with precondensed organosilica oligomers. CHEMICAL COMMUNICATIONS. 2012;48(22):2797–9.
- MLA
- Goethals, Frederik, Mikhail R Baklanov, Ivan Ciofi, et al. “A New Procedure to Seal the Pores of Mesoporous Low-k Films with Precondensed Organosilica Oligomers.” CHEMICAL COMMUNICATIONS 48.22 (2012): 2797–2799. Print.