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SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device

shankar kumar Selvaraja UGent, Erik Rosseel, Luis Fernandez, Martin Tabat, Wim Bogaerts UGent, John Hautala and Philippe Absil (2011) 2011 IEEE 8th International Conference on Group IV Photonics (GFP). p.71-73
abstract
We present our recent results on Si thickness uniformity improvement in a SOI wafer. We improved the thickness uniformity by 50%. The effect of the correction process on the propagation loss and device uniformity is also presented.
Please use this url to cite or link to this publication:
author
organization
year
type
conference
publication status
published
subject
keyword
integrated optics, etching, light propagation, nanophotonics, optical losses, silicon-on-insulator
in
2011 IEEE 8th International Conference on Group IV Photonics (GFP)
pages
71 - 73
publisher
IEEE
place of publication
Piscataway, NJ, USA
conference name
8th International conference in Group IV Photonics (GFP 2011)
conference location
London, UK
conference start
2011-09-14
conference end
2011-09-16
Web of Science type
Conference Paper
Web of Science id
12341300
ISBN
9781424483402
9781424483396
9781424483389
DOI
10.1109/GROUP4.2011.6053719
language
English
UGent publication?
yes
classification
C1
copyright statement
I have transferred the copyright for this publication to the publisher
id
1964334
handle
http://hdl.handle.net/1854/LU-1964334
date created
2011-12-09 11:50:04
date last changed
2011-12-12 16:12:52
@inproceedings{1964334,
  abstract     = {We present our recent results on Si thickness uniformity improvement in a SOI wafer. We improved the thickness uniformity by 50\%. The effect of the correction process on the propagation loss and device uniformity is also presented.},
  author       = {Selvaraja, shankar kumar and Rosseel, Erik and Fernandez, Luis and Tabat, Martin and Bogaerts, Wim and Hautala, John and Absil, Philippe},
  booktitle    = {2011 IEEE 8th International Conference on Group IV Photonics (GFP)},
  isbn         = {9781424483402},
  keyword      = {integrated optics,etching,light propagation,nanophotonics,optical losses,silicon-on-insulator},
  language     = {eng},
  location     = {London, UK},
  pages        = {71--73},
  publisher    = {IEEE},
  title        = {SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device},
  url          = {http://dx.doi.org/10.1109/GROUP4.2011.6053719},
  year         = {2011},
}

Chicago
Selvaraja, shankar kumar, Erik Rosseel, Luis Fernandez, Martin Tabat, Wim Bogaerts, John Hautala, and Philippe Absil. 2011. “SOI Thickness Uniformity Improvement Using Corrective Etching for Silicon Nano-photonic Device.” In 2011 IEEE 8th International Conference on Group IV Photonics (GFP), 71–73. Piscataway, NJ, USA: IEEE.
APA
Selvaraja, shankar kumar, Rosseel, E., Fernandez, L., Tabat, M., Bogaerts, W., Hautala, J., & Absil, P. (2011). SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device. 2011 IEEE 8th International Conference on Group IV Photonics (GFP) (pp. 71–73). Presented at the 8th International conference in Group IV Photonics (GFP 2011), Piscataway, NJ, USA: IEEE.
Vancouver
1.
Selvaraja shankar kumar, Rosseel E, Fernandez L, Tabat M, Bogaerts W, Hautala J, et al. SOI thickness uniformity improvement using corrective etching for silicon nano-photonic device. 2011 IEEE 8th International Conference on Group IV Photonics (GFP). Piscataway, NJ, USA: IEEE; 2011. p. 71–3.
MLA
Selvaraja, shankar kumar, Erik Rosseel, Luis Fernandez, et al. “SOI Thickness Uniformity Improvement Using Corrective Etching for Silicon Nano-photonic Device.” 2011 IEEE 8th International Conference on Group IV Photonics (GFP). Piscataway, NJ, USA: IEEE, 2011. 71–73. Print.