Advanced search

On the diffusion and activation of ion-implanted n-type dopants in germanium

Author
Organization
Keywords
P-IMPLANTATION, PHOSPHORUS, MECHANISM, JUNCTIONS

Citation

Please use this url to cite or link to this publication:

Chicago
Simoen, Eddy, and Jan Vanhellemont. 2009. “On the Diffusion and Activation of Ion-implanted N-type Dopants in Germanium.” Journal of Applied Physics 106 (10).
APA
Simoen, Eddy, & Vanhellemont, J. (2009). On the diffusion and activation of ion-implanted n-type dopants in germanium. JOURNAL OF APPLIED PHYSICS, 106(10).
Vancouver
1.
Simoen E, Vanhellemont J. On the diffusion and activation of ion-implanted n-type dopants in germanium. JOURNAL OF APPLIED PHYSICS. 2009;106(10).
MLA
Simoen, Eddy, and Jan Vanhellemont. “On the Diffusion and Activation of Ion-implanted N-type Dopants in Germanium.” JOURNAL OF APPLIED PHYSICS 106.10 (2009): n. pag. Print.
@article{1959028,
  articleno    = {103516},
  author       = {Simoen, Eddy and Vanhellemont, Jan},
  issn         = {0021-8979},
  journal      = {JOURNAL OF APPLIED PHYSICS},
  keyword      = {P-IMPLANTATION,PHOSPHORUS,MECHANISM,JUNCTIONS},
  language     = {eng},
  number       = {10},
  pages        = {4},
  title        = {On the diffusion and activation of ion-implanted n-type dopants in germanium},
  url          = {http://dx.doi.org/10.1063/1.3261838},
  volume       = {106},
  year         = {2009},
}

Altmetric
View in Altmetric
Web of Science
Times cited: