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Smart textiles: an explorative study of the use of magnetron sputter deposition

(2011) TEXTILE RESEARCH JOURNAL. 81(17). p.1808-1817
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Abstract
Reactive magnetron sputtering is a widely used deposition technique in different application areas. In this study its use is evaluated for the deposition of metal thin films (Al, Cu and Ti) and oxide thin films (Al2O3, TiOx) on woven and nonwoven substrates. The study shows that good adhesion can only be achieved when the substrate is pre-treated in a glow discharge. The influence of the substrate on the reflectivity of Al and Cu thin films was investigated. For conductive textile applications, the resistivity of metal thin films and TiOx was investigated.
Keywords
textiles, magnetron sputtering

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Citation

Please use this url to cite or link to this publication:

Chicago
Depla, Diederik, Siegfried Segers, Wouter Leroy, Tom Van Hove, and Marc Van Parys. 2011. “Smart Textiles: An Explorative Study of the Use of Magnetron Sputter Deposition.” Textile Research Journal 81 (17): 1808–1817.
APA
Depla, D., Segers, S., Leroy, W., Van Hove, T., & Van Parys, M. (2011). Smart textiles: an explorative study of the use of magnetron sputter deposition. TEXTILE RESEARCH JOURNAL, 81(17), 1808–1817.
Vancouver
1.
Depla D, Segers S, Leroy W, Van Hove T, Van Parys M. Smart textiles: an explorative study of the use of magnetron sputter deposition. TEXTILE RESEARCH JOURNAL. 2011;81(17):1808–17.
MLA
Depla, Diederik, Siegfried Segers, Wouter Leroy, et al. “Smart Textiles: An Explorative Study of the Use of Magnetron Sputter Deposition.” TEXTILE RESEARCH JOURNAL 81.17 (2011): 1808–1817. Print.
@article{1934648,
  abstract     = {Reactive magnetron sputtering is a widely used deposition technique in different application areas. In this study its use is evaluated for the deposition of metal thin films (Al, Cu and Ti) and oxide thin films (Al2O3, TiOx) on woven and nonwoven substrates. The study shows that good adhesion can only be achieved when the substrate is pre-treated in a glow discharge. The influence of the substrate on the reflectivity of Al and Cu thin films was investigated. For conductive textile applications, the resistivity of metal thin films and TiOx was investigated.},
  author       = {Depla, Diederik and Segers, Siegfried and Leroy, Wouter and Van Hove, Tom and Van Parys, Marc},
  issn         = {0040-5175},
  journal      = {TEXTILE RESEARCH JOURNAL},
  language     = {eng},
  number       = {17},
  pages        = {1808--1817},
  title        = {Smart textiles: an explorative study of the use of magnetron sputter deposition},
  url          = {http://dx.doi.org/10.1177/0040517511411966},
  volume       = {81},
  year         = {2011},
}

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