Smart textiles: an explorative study of the use of magnetron sputter deposition
- Author
- Diederik Depla (UGent) , Siegfried Segers (UGent) , Wouter Leroy (UGent) , Tom Van Hove and Marc Van Parys
- Organization
- Abstract
- Reactive magnetron sputtering is a widely used deposition technique in different application areas. In this study its use is evaluated for the deposition of metal thin films (Al, Cu and Ti) and oxide thin films (Al2O3, TiOx) on woven and nonwoven substrates. The study shows that good adhesion can only be achieved when the substrate is pre-treated in a glow discharge. The influence of the substrate on the reflectivity of Al and Cu thin films was investigated. For conductive textile applications, the resistivity of metal thin films and TiOx was investigated.
- Keywords
- textiles, magnetron sputtering
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Citation
Please use this url to cite or link to this publication: http://hdl.handle.net/1854/LU-1934648
- MLA
- Depla, Diederik, et al. “Smart Textiles: An Explorative Study of the Use of Magnetron Sputter Deposition.” TEXTILE RESEARCH JOURNAL, vol. 81, no. 17, 2011, pp. 1808–17, doi:10.1177/0040517511411966.
- APA
- Depla, D., Segers, S., Leroy, W., Van Hove, T., & Van Parys, M. (2011). Smart textiles: an explorative study of the use of magnetron sputter deposition. TEXTILE RESEARCH JOURNAL, 81(17), 1808–1817. https://doi.org/10.1177/0040517511411966
- Chicago author-date
- Depla, Diederik, Siegfried Segers, Wouter Leroy, Tom Van Hove, and Marc Van Parys. 2011. “Smart Textiles: An Explorative Study of the Use of Magnetron Sputter Deposition.” TEXTILE RESEARCH JOURNAL 81 (17): 1808–17. https://doi.org/10.1177/0040517511411966.
- Chicago author-date (all authors)
- Depla, Diederik, Siegfried Segers, Wouter Leroy, Tom Van Hove, and Marc Van Parys. 2011. “Smart Textiles: An Explorative Study of the Use of Magnetron Sputter Deposition.” TEXTILE RESEARCH JOURNAL 81 (17): 1808–1817. doi:10.1177/0040517511411966.
- Vancouver
- 1.Depla D, Segers S, Leroy W, Van Hove T, Van Parys M. Smart textiles: an explorative study of the use of magnetron sputter deposition. TEXTILE RESEARCH JOURNAL. 2011;81(17):1808–17.
- IEEE
- [1]D. Depla, S. Segers, W. Leroy, T. Van Hove, and M. Van Parys, “Smart textiles: an explorative study of the use of magnetron sputter deposition,” TEXTILE RESEARCH JOURNAL, vol. 81, no. 17, pp. 1808–1817, 2011.
@article{1934648,
abstract = {{Reactive magnetron sputtering is a widely used deposition technique in different application areas. In this study its use is evaluated for the deposition of metal thin films (Al, Cu and Ti) and oxide thin films (Al2O3, TiOx) on woven and nonwoven substrates. The study shows that good adhesion can only be achieved when the substrate is pre-treated in a glow discharge. The influence of the substrate on the reflectivity of Al and Cu thin films was investigated. For conductive textile applications, the resistivity of metal thin films and TiOx was investigated.}},
author = {{Depla, Diederik and Segers, Siegfried and Leroy, Wouter and Van Hove, Tom and Van Parys, Marc}},
issn = {{0040-5175}},
journal = {{TEXTILE RESEARCH JOURNAL}},
keywords = {{textiles,magnetron sputtering}},
language = {{eng}},
number = {{17}},
pages = {{1808--1817}},
title = {{Smart textiles: an explorative study of the use of magnetron sputter deposition}},
url = {{http://doi.org/10.1177/0040517511411966}},
volume = {{81}},
year = {{2011}},
}
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