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Interfacial reactions of Gd- and Nb-oxide based high-k layers deposited by aqueous chemical solution deposition

(2011) MICROELECTRONIC ENGINEERING. 88(7). p.1338-1341
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RARE-EARTH-OXIDES, GATE DIELECTRICS, High-k, GEL, TEMPERATURE, SILICATE, FILMS, NIOBIUM OXIDE, ACSD, GdOx, NbOx, GdNbOx, Interlayer formation, Ellipsometry, HT-XRD, GATR-FTIR, Thickness variation, High temperature anneal

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Citation

Please use this url to cite or link to this publication:

Chicago
Dewulf, D, N Peys, S Van Elshocht, Geert Rampelberg, Christophe Detavernier, S De Gendt, A Hardy, and MK Van Bael. 2011. “Interfacial Reactions of Gd- and Nb-oxide Based High-k Layers Deposited by Aqueous Chemical Solution Deposition.” Microelectronic Engineering 88 (7): 1338–1341.
APA
Dewulf, D., Peys, N., Van Elshocht, S., Rampelberg, G., Detavernier, C., De Gendt, S., Hardy, A., et al. (2011). Interfacial reactions of Gd- and Nb-oxide based high-k layers deposited by aqueous chemical solution deposition. MICROELECTRONIC ENGINEERING, 88(7), 1338–1341. Presented at the 17th International Conference on Insultating Films on Semiconductors.
Vancouver
1.
Dewulf D, Peys N, Van Elshocht S, Rampelberg G, Detavernier C, De Gendt S, et al. Interfacial reactions of Gd- and Nb-oxide based high-k layers deposited by aqueous chemical solution deposition. MICROELECTRONIC ENGINEERING. 2011;88(7):1338–41.
MLA
Dewulf, D, N Peys, S Van Elshocht, et al. “Interfacial Reactions of Gd- and Nb-oxide Based High-k Layers Deposited by Aqueous Chemical Solution Deposition.” MICROELECTRONIC ENGINEERING 88.7 (2011): 1338–1341. Print.
@article{1934575,
  author       = {Dewulf, D and Peys, N and Van Elshocht, S and Rampelberg, Geert and Detavernier, Christophe and De Gendt, S and Hardy, A and Van Bael, MK},
  issn         = {0167-9317},
  journal      = {MICROELECTRONIC ENGINEERING},
  language     = {eng},
  location     = {Grenoble, France},
  number       = {7},
  pages        = {1338--1341},
  title        = {Interfacial reactions of Gd- and Nb-oxide based high-k layers deposited by aqueous chemical solution deposition},
  url          = {http://dx.doi.org/10.1016/j.mee.2011.03.045},
  volume       = {88},
  year         = {2011},
}

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