Ghent University Academic Bibliography

Advanced

Initial stages of few-layer graphene growth by microwave plasma-enhanced chemical vapour deposition

Roumen Vitchev, Alexander Malesevic, Roumen Petrov UGent, Raymond Kemps, Myrjam Mertens, Annick Vanhulsel and Chris Van Haesendonck (2010) NANOTECHNOLOGY. 21(9).
abstract
A promising method for the production of few-layer graphene (FLG) is microwave plasma-enhanced chemical vapour deposition (MW PECVD). However, the growth mechanism of PECVD-synthesized FLG is not completely understood. The aim of this work was to investigate the initial stages of the growth process of FLG deposited by MW PECVD on several substrates (quartz, silicon, platinum). The deposited thin films were characterized by angle-resolved x-ray photoelectron spectroscopy (ARXPS), electron backscattered diffraction (EBSD), scanning electron microscopy (SEM) and x-ray diffraction (XRD). It was found that the initial stages of the deposition were different for the three chosen substrate materials. However, the fully grown FLG layers were similar for all substrates.
Please use this url to cite or link to this publication:
author
organization
year
type
journalArticle (original)
publication status
published
subject
keyword
CARBON NANOTUBES, FILMS
journal title
NANOTECHNOLOGY
Nanotechnology
volume
21
issue
9
article_number
095602
pages
7 pages
Web of Science type
Article
Web of Science id
000274360300020
JCR category
MATERIALS SCIENCE, MULTIDISCIPLINARY
JCR impact factor
3.644 (2010)
JCR rank
30/219 (2010)
JCR quartile
1 (2010)
ISSN
0957-4484
DOI
10.1088/0957-4484/21/9/095602
language
English
UGent publication?
yes
classification
A1
copyright statement
I have transferred the copyright for this publication to the publisher
id
1919157
handle
http://hdl.handle.net/1854/LU-1919157
date created
2011-09-30 11:46:31
date last changed
2011-10-03 15:55:26
@article{1919157,
  abstract     = {A promising method for the production of few-layer graphene (FLG) is microwave plasma-enhanced chemical vapour deposition (MW PECVD). However, the growth mechanism of PECVD-synthesized FLG is not completely understood. The aim of this work was to investigate the initial stages of the growth process of FLG deposited by MW PECVD on several substrates (quartz, silicon, platinum). The deposited thin films were characterized by angle-resolved x-ray photoelectron spectroscopy (ARXPS), electron backscattered diffraction (EBSD), scanning electron microscopy (SEM) and x-ray diffraction (XRD). It was found that the initial stages of the deposition were different for the three chosen substrate materials. However, the fully grown FLG layers were similar for all substrates.},
  articleno    = {095602},
  author       = {Vitchev, Roumen and Malesevic, Alexander and Petrov, Roumen and Kemps, Raymond and Mertens, Myrjam and Vanhulsel, Annick and Van Haesendonck, Chris},
  issn         = {0957-4484},
  journal      = {NANOTECHNOLOGY},
  keyword      = {CARBON NANOTUBES,FILMS},
  language     = {eng},
  number       = {9},
  pages        = {7},
  title        = {Initial stages of few-layer graphene growth by microwave plasma-enhanced chemical vapour deposition},
  url          = {http://dx.doi.org/10.1088/0957-4484/21/9/095602},
  volume       = {21},
  year         = {2010},
}

Chicago
Vitchev, Roumen, Alexander Malesevic, Roumen Petrov, Raymond Kemps, Myrjam Mertens, Annick Vanhulsel, and Chris Van Haesendonck. 2010. “Initial Stages of Few-layer Graphene Growth by Microwave Plasma-enhanced Chemical Vapour Deposition.” Nanotechnology 21 (9).
APA
Vitchev, R., Malesevic, A., Petrov, R., Kemps, R., Mertens, M., Vanhulsel, A., & Van Haesendonck, C. (2010). Initial stages of few-layer graphene growth by microwave plasma-enhanced chemical vapour deposition. NANOTECHNOLOGY, 21(9).
Vancouver
1.
Vitchev R, Malesevic A, Petrov R, Kemps R, Mertens M, Vanhulsel A, et al. Initial stages of few-layer graphene growth by microwave plasma-enhanced chemical vapour deposition. NANOTECHNOLOGY. 2010;21(9).
MLA
Vitchev, Roumen, Alexander Malesevic, Roumen Petrov, et al. “Initial Stages of Few-layer Graphene Growth by Microwave Plasma-enhanced Chemical Vapour Deposition.” NANOTECHNOLOGY 21.9 (2010): n. pag. Print.