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Advantages and challenges of plasma enhanced atomic layer deposition

Jan Musschoot (UGent)
(2011)
Author
Promoter
(UGent)
Organization
Keywords
modeling, nonwoven, conformality, titanium nitride, ruthenium, zinc oxide, vanadium pentoxide, titanium dioxide, plasma enhanced atomic layer deposition, plasma, atomic layer deposition, thin films

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Citation

Please use this url to cite or link to this publication:

Chicago
Musschoot, Jan. 2011. “Advantages and Challenges of Plasma Enhanced Atomic Layer Deposition”. Ghent, Belgium: Ghent University. Faculty of Sciences.
APA
Musschoot, J. (2011). Advantages and challenges of plasma enhanced atomic layer deposition. Ghent University. Faculty of Sciences, Ghent, Belgium.
Vancouver
1.
Musschoot J. Advantages and challenges of plasma enhanced atomic layer deposition. [Ghent, Belgium]: Ghent University. Faculty of Sciences; 2011.
MLA
Musschoot, Jan. “Advantages and Challenges of Plasma Enhanced Atomic Layer Deposition.” 2011 : n. pag. Print.
@phdthesis{1860582,
  author       = {Musschoot, Jan},
  keywords     = {modeling,nonwoven,conformality,titanium nitride,ruthenium,zinc oxide,vanadium pentoxide,titanium dioxide,plasma enhanced atomic layer deposition,plasma,atomic layer deposition,thin films},
  language     = {eng},
  pages        = {XX, 152 in multiple pagination + annexes},
  publisher    = {Ghent University. Faculty of Sciences},
  school       = {Ghent University},
  title        = {Advantages and challenges of plasma enhanced atomic layer deposition},
  year         = {2011},
}