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Yttria-stabilized zirconia thin films grown by r.f. magnetron sputtering from an oxide target

Henryk Tomaszewski, Johan Haemers UGent, Nico De Roo UGent, Jurgen Denul UGent and Roger De Gryse UGent (1997) THIN SOLID FILMS. 293(1-2). p.67-74
abstract
Yttria-stabilized zirconia thin films with cubic crystallographic structure were deposited onto glass substrates by r.f. magnetron sputtering from an oxide target. It was found that zirconia growth is strongly dependent on the sputtering power and pressure. At low power and high pressure, zirconia grows preferentially in the (200) direction with columnar microstructure. In contrast, high power and low sputtering pressures promote the growth of randomly oriented polycrystalline zirconia. Increasing the argon flow at constant power and sputtering pressure again favours preferential growth of zirconia layers, however, not in the (200) direction as before, but in the (111) direction.
Please use this url to cite or link to this publication:
author
organization
alternative title
Yttria-stabilized zirconia thin films grown by rf magnetron sputtering from an oxide target
year
type
journalArticle (original)
publication status
published
subject
keyword
LASER DEPOSITION, ION-BOMBARDMENT, ENERGETIC OXYGEN-ATOMS, sputtering, growth mechanism, oxides, ZNO, BATIO3, BEAM
journal title
THIN SOLID FILMS
Thin Solid Films
volume
293
issue
1-2
pages
67 - 74
Web of Science type
Article
ISSN
0040-6090
DOI
10.1016/S0040-6090(96)09089-X
language
English
UGent publication?
yes
classification
A1
additional info
correction [acknowledgement] published in: Thin Solid Films (1997) 305(1-2), 358 ; DOI 10.1016/S0040-6090(97)00346-5
copyright statement
I have transferred the copyright for this publication to the publisher
id
182931
handle
http://hdl.handle.net/1854/LU-182931
date created
2004-01-14 13:41:00
date last changed
2016-12-19 15:39:12
@article{182931,
  abstract     = {Yttria-stabilized zirconia thin films with cubic crystallographic structure were deposited onto glass substrates by r.f. magnetron sputtering from an oxide target. It was found that zirconia growth is strongly dependent on the sputtering power and pressure. At low power and high pressure, zirconia grows preferentially in the (200) direction with columnar microstructure. In contrast, high power and low sputtering pressures promote the growth of randomly oriented polycrystalline zirconia. Increasing the argon flow at constant power and sputtering pressure again favours preferential growth of zirconia layers, however, not in the (200) direction as before, but in the (111) direction.},
  author       = {Tomaszewski, Henryk and Haemers, Johan and De Roo, Nico and Denul, Jurgen and De Gryse, Roger},
  issn         = {0040-6090},
  journal      = {THIN SOLID FILMS},
  keyword      = {LASER DEPOSITION,ION-BOMBARDMENT,ENERGETIC OXYGEN-ATOMS,sputtering,growth mechanism,oxides,ZNO,BATIO3,BEAM},
  language     = {eng},
  number       = {1-2},
  pages        = {67--74},
  title        = {Yttria-stabilized zirconia thin films grown by r.f. magnetron sputtering from an oxide target},
  url          = {http://dx.doi.org/10.1016/S0040-6090(96)09089-X},
  volume       = {293},
  year         = {1997},
}

Chicago
Tomaszewski, Henryk, Johan Haemers, Nico De Roo, Jurgen Denul, and Roger De Gryse. 1997. “Yttria-stabilized Zirconia Thin Films Grown by R.f. Magnetron Sputtering from an Oxide Target.” Thin Solid Films 293 (1-2): 67–74.
APA
Tomaszewski, Henryk, Haemers, J., De Roo, N., Denul, J., & De Gryse, R. (1997). Yttria-stabilized zirconia thin films grown by r.f. magnetron sputtering from an oxide target. THIN SOLID FILMS, 293(1-2), 67–74.
Vancouver
1.
Tomaszewski H, Haemers J, De Roo N, Denul J, De Gryse R. Yttria-stabilized zirconia thin films grown by r.f. magnetron sputtering from an oxide target. THIN SOLID FILMS. 1997;293(1-2):67–74.
MLA
Tomaszewski, Henryk, Johan Haemers, Nico De Roo, et al. “Yttria-stabilized Zirconia Thin Films Grown by R.f. Magnetron Sputtering from an Oxide Target.” THIN SOLID FILMS 293.1-2 (1997): 67–74. Print.